Native target chemistry during reactive dc magnetron sputtering studied by ex-situ x-ray photoelectron spectroscopy

被引：10

作者：

Greczynski, G. ^{[1
,2
]}

Mraz, S. ^{[2
]}

Schneider, J. M. ^{[2
]}

Hultman, L. ^{[1
]}

机构：

[1] Linkoping Univ, Dept Phys IFM, Thin Film Phys Div, SE-58183 Linkoping, Sweden

[2] Rhein Westfal TH Aachen, Mat Chem, Kopernikusstr 10, D-52074 Aachen, Germany

来源：

APPLIED PHYSICS LETTERS | 2017年 / 111卷 / 02期

关键词：

DYNAMIC COMPOSITION CHANGES; INTERFACIAL REACTIONS; ION-IMPLANTATION; THIN-FILMS; TITANIUM; SIMULATION; SPECTRA; MODEL; TIN; MECHANISMS;

D O I：

10.1063/1.4993787

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report x-ray photoelectron spectroscopy (XPS) analysis of native Ti target surface chemistry during magnetron sputtering in an Ar/N-2 atmosphere. To avoid air exposure, the target is capped immediately after sputtering with a few-nm-thick Al overlayers; hence, information about the chemical state of target elements as a function of N-2 partial pressure p(N2) is preserved. Contrary to previous reports, which assume stoichiometric TiN formation, we present direct evidence, based on core-level XPS spectra and TRIDYN simulations, that the target surface is covered by TiNx with x varying in a wide range, from 0.27 to 1.18, depending on p(N2). This has far-reaching consequences both for modelling of the reactive sputtering process and for everyday thin film growth where detailed knowledge of the target state is crucial. Published by AIP Publishing.

引用

页数：5

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