Deposition of pure gold thin films from organometallic precursors

被引：7
|
作者：
Parkhomenko, Roman G. [1 ]
Trubin, Sergey V. [1 ]
Turgambaeva, Asiya E. [1 ]
Igumenov, Igor K. [1 ]
机构：
[1] SB RAS, Nikolaev Inst Inorgan Chem, Novosibirsk 630090, Russia
来源：
JOURNAL OF CRYSTAL GROWTH | 2015年 / 414卷
关键词：
High purity; VUV irradiation; MOCVD; Gold thin films; THERMAL-BEHAVIOR; VAPOR; CVD; NANOPARTICLES;
D O I：
10.1016/j.jcrysgro.2014.09.034
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
Using metallorganic chemical vapor deposition, pure gold thin films have been obtained from a number of volatile dimethylgold(III) complexes with different types of chelating organic ligands. Deposition was performed in argon (10 Torr) with and without hydrogen and oxygen as reactant gases and with additional VUV (vacuum ultraviolet) stimulation. According to the XRD phase analysis, gold films grow mainly in [111] direction. The influence of precursor structure on the morphology of the deposited layers was demonstrated. It was established that presence of H-2 raises the growth rate and porosity of the films significantly with decreased amount of any impurities. With the VUV stimulation, the gold content in the films amounts to > 99 at%. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码：143 / 150
页数：8
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