High performance ultra-compact SOI waveguide crossing

被引:36
作者
Han, Hai-Long [1 ]
Li, He [1 ]
Zhang, Xiao-Pei [1 ]
Liu, Ang [1 ]
Lin, Tian-Ying [1 ]
Chen, Ze [1 ]
Lv, Hai-Bin [2 ]
Lu, Ming-Hui [1 ]
Liu, Xiao-Ping [1 ]
Chen, Yan-Feng [1 ]
机构
[1] Nanjing Univ, Coll Engn & Appl Sci, Collaborat Innovat Ctr Adv Microstruct, Natl Lab Solid State Microstruct, Nanjing 210093, Jiangsu, Peoples R China
[2] Natl Univ Def Technol, Changsha 410073, Hunan, Peoples R China
关键词
LOW-CROSSTALK; DESIGN;
D O I
10.1364/OE.26.025602
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Waveguide crossing is an important integrated photonic component that will be routinely used for high-density and large-scale photonic integrated circuits, such as optical switches and routers. Several techniques have been reported in achieving high performance waveguide crossings on a silicon-on-insulator photonic platform, i.e., low-loss and low-crosstalk waveguide crossings based on multimode interference, bi-layer tapering, optical transformation, metamaterials, and subwavelength gratings. Until recently, not much attention has been given to the reduction of the footprint of waveguide crossings. Here we experimentally demonstrate an ultra-compact waveguide crossing on silicon photonic platform with a footprint only similar to 1 x 1 mu m(2). Our simulations show that it has a low insertion loss (< 0.175 dB) and low crosstalk (< -37dB) across the whole C-band, while the fabricated one has an insertion loss < 0.28 dB and crosstalk around -30 dB for the C-band. (C) 2018 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
引用
收藏
页码:25602 / 25610
页数:9
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