Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

被引：50

作者：

Alasaarela, T. ^{[1
]}

Saastamoinen, T. ^{[2
]}

Hiltunen, J. ^{[3
,4
]}

Saynatjoki, A. ^{[1
]}

Tervonen, A. ^{[1
]}

Stenberg, P. ^{[2
]}

Kuittinen, M. ^{[2
]}

Honkanen, S. ^{[1
]}

机构：

[1] Aalto Univ Sch Sci & Technol, Dept Micro & Nanosci, FI-00076 Aalto, Finland

[2] Univ Eastern Finland, Dept Phys, FIN-80101 Joensuu, Finland

[3] VTT Tech Res Ctr Finland, FIN-90571 Oulu, Finland

[4] Univ Oulu, Microelect & Mat Phys Labs, FIN-90014 Oulu, Finland

来源：

APPLIED OPTICS | 2010年 / 49卷 / 22期

基金：

芬兰科学院;

关键词：

TIO2; THIN-FILMS; GROWTH;

D O I：

10.1364/AO.49.004321

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We demonstrate good optical quality TiO2 thin films grown by atomic layer deposition at 120 degrees C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1 dB/cm at 1.53 mu m. A high quality resonant waveguide grating was fabricated using a thin TiO2 layer on top of a SiO2 grating. (C) 2010 Optical Society of America

引用

页码：4321 / 4325

页数：5

共 21 条

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