Investigation of plasma parameters in the DC planar magnetron in balanced and unbalanced mode

DC planar magnetrons are quite often used for deposition of thin layers. Hence, the diagnostics of magnetron plasma and application of magnetron in surface technology are of great interest at present time. The investigated magnetron (type Vtech75 by Gencoa) is operated in balanced as well as in unbalanced mode. A Ti target was used. Argon or a mixture of argon and nitrogen are used as process gases. Discharge power and pressure are varied. The plasma is investigated by a radially movable Langmuir probe positioned in the plane of the substrate. Electron mean energy, electron density and the plasma potential at different radial probe positions are estimated. Moreover, measurements with an energy resolved mass spectrometer are performed. The flow densities of ions to the substrate are obtained. The results from both investigation methods are discussed.