Molecular adsorption of GH3CN and C5H5N on si(111)7x7

被引：13

作者：

Shirota, N

Yagi, S

Taniguchi, M

Hashimoto, E

机构：

[1] Hiroshima Univ, Fac Sci, Higashihiroshima 7398526, Japan

[2] Hiroshima Univ, Ctr Synchrotron Radiat, Higashihiroshima 7398526, Japan

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2000年 / 18卷 / 05期

关键词：

D O I：

10.1116/1.1286392

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The adsorption structures of CH3CN and C5H5N molecules on the Si(111)7X7 surface have been studied by a law temperature scanning tunneling microscopy. These molecular adsorption sites are across the dimer row of the Si(111)7X7 surface. These molecular adsorption structures can be explained, assuming the dipole-dipole interaction between the molecules and the Si(111)7X7 surface. (C) 2000 American Vacuum Society. [S0734-2101(00)03605-8].

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页码：2578 / 2580

页数：3

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