CMOS Active-Pixel Sensor in Low Temperature

被引:0
作者
do Rosario, Pedro V. F. [1 ]
Salles, Luciana P. [1 ]
de Mello, Artur S. B. [1 ]
de Lima Monteiro, Davies W. [1 ]
机构
[1] Univ Fed Minas Gerais, Dept Elect Engn, OptMAlab, BR-31270010 Belo Horizonte, MG, Brazil
来源
2014 29th Symposium on Microelectronics Technology and Devices (SBMicro) | 2014年
关键词
Active Pixel Sensor; cryogenic circuits; low temperature; CMOS analog integrated circuits; photodiode; optical sensor; integrated optoelectronics;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents experimental and simulated results of an Active-Pixel Sensor (APS) circuit operating at different temperatures (300K, 17K, 60K and 40K). The optical sensor used was a silicon photodiode integrated with its electronics in a standard CMOS 0.35 mu m technology. Interestingly, the pixel worked well at all temperatures tested. These first experimental results are very promising for future hybridization between APS circuits and infrared quantum sensors, mostly on III-V semiconductor substrates, or other applications demanding low temperatures.
引用
收藏
页数:4
相关论文
共 10 条
[1]  
[Anonymous], 2007, IEEE T CIRCUITS SYST, V54
[2]  
Chasin A. V., 2008, SBMICRO 2008
[3]  
Hammoud A., 2003, ICECS 2003, V1, p44
[4]   MOSFET modeling for design of ultra-high performance infrared CMOS imagers working at cryogenic temperatures: Case of an analog/digital 0.18 μm CMOS process [J].
Martin, P. ;
Royet, A. S. ;
Guellec, F. ;
Ghibaudo, G. .
SOLID-STATE ELECTRONICS, 2011, 62 (01) :115-122
[5]  
Rosario P.V.F, 2013, CHIP CUR SBMICRO 201
[6]  
Serra- Graells F., CIRC SYST 2005 ISCAS
[7]   Design and Fabrication of Vertically-Integrated CMOS Image Sensors [J].
Skorka, Orit ;
Joseph, Dileepan .
SENSORS, 2011, 11 (05) :4512-4538
[8]  
Sze S. M., 2012, SEMICONDUCTOR DEVICE, P39
[9]   Large area CMOS image sensors [J].
Turchetta, R. ;
Guerrini, N. ;
Sedgwick, I. .
JOURNAL OF INSTRUMENTATION, 2011, 6
[10]  
Wada T., 2012, J LOW TEMPERATURE PH, V167