Compressive strain-induced metal-insulator transition in orthorhombic SrIrO3 thin films

被引:77
作者
Gruenewald, John H. [1 ]
Nichols, John [1 ]
Terzic, Jasminka [1 ]
Cao, Gang [1 ]
Brill, Joseph W. [1 ]
Seo, Sung S. Ambrose [1 ]
机构
[1] Univ Kentucky, Dept Phys & Astron, Lexington, KY 40506 USA
基金
美国国家科学基金会;
关键词
LOCALIZATION; CONDUCTION;
D O I
10.1557/jmr.2014.288
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Orthorhombic SrIrO3 is a correlated metal whose electronic properties are highly susceptible to external perturbations due to the comparable interactions of spin-orbit interaction and electronic correlation. We have investigated the electronic properties of epitaxial orthorhombic SrIrO3 thin-films under compressive strain using transport measurements, optical absorption spectra, and magnetoresistance. The metastable, orthorhombic SrIrO3 thin-films are synthesized on various substrates using an epi-stabilization technique. We have observed that as in-plane lattice compression is increased, the dc-resistivity (rho) of the thin films increases by a few orders of magnitude, and the d rho/dT changes from positive to negative values. However, optical absorption spectra show Drude-like, metallic responses without an optical gap opening for all compressively strained thin films. Transport measurements under magnetic fields show negative magnetoresistance at low temperature for compressively strained thin-films. Our results suggest that weak localization is responsible for the strain-induced metal-insulator transition for the orthorhombic SrIrO3 thin-films.
引用
收藏
页码:2491 / 2496
页数:6
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