Analysis on the defects in the molecular structures of MgO films deposited with different evaporation rates in AC plasma display panels

MgO films were deposited with the various MgO evaporation rates and the physical characteristics of the MgO films were investigated and analyzed. The properties of MgO, such as crystal orientation, surface roughness, film structure, were inspected using X-ray diffraction (XRD), atomic force microscopy, and secondary electron microscopy. From the experiments and Paschen's law, the maximum value of the secondary electron emission coefficient (gamma) was obtained at an evaporation rate of 5 angstrom/sec. The XRD results and the cathodeluminescence spectra show that the gamma values are correlated with the F/F+ centers of the molecule structures of the MgO films. The RMS surface roughness and the column-type structure also show the efficient characteristics of MgO film deposited at a rate of 5 angstrom/sec.