Silicon-wire optical demultiplexers based on multistage delayed Mach-Zehnder interferometers for higher production yield

被引:23
作者
Jeong, Seok-Hwan [1 ]
Tanaka, Yu [1 ]
机构
[1] PETRA, AIST West 7SCR,16-1 Onogawa, Tsukuba, Ibaraki 3058569, Japan
关键词
IMMERSION LITHOGRAPHY PROCESS; SOI WAFER;
D O I
10.1364/AO.57.006474
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We report better spectral uniformity in Si-wire-based multistage delayed Mach-Zehnder interferometer (DMZI) type optical multiplexers/demultiplexers (MUX/DeMUX). Based on a 300 mm silicon-on-insulator wafer-scale ArF-immersion lithography process that guarantees higher phase controllability for low insertion loss, spectral flatness, and low crosstalk, we were able to further improve spectral uniformity across the wafer by optimizing the waveguide width within the optical path of each DMZI region. Irrespective of channel spacing in the wavelength domain, it was experimentally demonstrated that the filter spectral center wavelength deviation of the proposed DeMUXs was three times smaller than that of conventional ones. The proposed device scheme would also be attractive for arbitrary channel spacing and channel count, which makes the proposed scheme more practical in high-performance wavelength division multiplexing optical transceivers. (C) 2018 Optical Society of America
引用
收藏
页码:6474 / 6480
页数:7
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