Extraction of the point-spread function in electron-beam lithography using a cross geometry

被引:2
作者
Schefzyk, D. [1 ]
Biesinger, D. E. F. [1 ]
Wharam, D. A. [1 ]
机构
[1] Univ Tubingen, Inst Angew Phys, D-72076 Tubingen, Germany
关键词
Proximity effect; Electron-beam lithography; PROXIMITY EFFECT CORRECTION;
D O I
10.1016/j.mee.2009.11.059
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
For high-quality dose corrections an accurate knowledge of the dose distribution of a single spot, the point-spread function (psf), is required. Usually this information is obtained by writing a set of parallel lines of variable separation and dosage. Subsequent analysis gives information about the value of the psf as a function of the chosen separation. Here we present an alternative method to extract the psf at arbitrary separation and to a high degree of accuracy. This is based upon the exposure of a cross shaped geometry, in which all relevant separations are present. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:1091 / 1094
页数:4
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