Dependence of field emission from AlxGa1-xN on the stoichiometric composition for x≤0.7

被引:1
作者
Chung, MS [1 ]
Cutler, PH
Miskovsky, NM
机构
[1] Univ Ulsan, Dept Phys, Ulsan 680749, South Korea
[2] Penn State Univ, Dept Phys, University Pk, PA 16802 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2003年 / 21卷 / 01期
关键词
D O I
10.1116/1.1524135
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The field emission current density j from the ternary alloy AlxGa1-xN is fully calculated as a function of a stoichiometric composition x. The carrier concentration. n is numerically obtained as a function of x from the measured values of n. Most of the other material parameters of AlxGa1-xN are obtained,as a function of x by averaging those of GaN and AlN. Then we use an exact scheme to calculate j as a function of x for x less than or equal to 0.7. The calculated plots of j versus x are different in shape according to the value of electron affinity, x, of AlxGa1-xN. For low x, j has a peak in the transition region, from semiconductor to insulator while for high X, j does not. Such a peak becomes more apparent and moves toward a smaller x as x decreases and the field F increases. (C) 2003 American Vacuum Society.
引用
收藏
页码:418 / 421
页数:4
相关论文
共 23 条
[1]  
[Anonymous], SEMICONDUCTOR BASIC
[2]   UV photoemission study of heteroepitaxial AlGaN films grown on 6H-SiC [J].
Benjamin, MC ;
Bremser, MD ;
Weeks, TW ;
King, SW ;
Davis, RF ;
Nemanich, RJ .
APPLIED SURFACE SCIENCE, 1996, 104 :455-460
[3]   Band structure calculation of field emission from AlxGa1-xN as a function of stoichiometry [J].
Chung, MS ;
Miskovsky, NM ;
Cutler, PH ;
Kumar, N .
APPLIED PHYSICS LETTERS, 2000, 76 (09) :1143-1145
[4]   Carrier concentration-dependence of field emission from semiconductors [J].
Chung, MS ;
Yoon, BG ;
Park, JM ;
Ha, KY .
APPLIED SURFACE SCIENCE, 1999, 146 (1-4) :138-142
[5]   Calculations of field emission from AlxGa1-xN as a function of stoichiometry [J].
Chung, MS ;
Cutler, PH ;
Miskovsky, NM ;
Kumar, N .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (02) :919-922
[6]   Electron emission from graded AlxGa1-xN/GaN negative-electron-affinity cold cathodes [J].
Deguchi, M ;
Uenoyama, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2000, 39 (7A) :L641-L643
[7]   Electron affinity of AlxGa1-xN(0001) surfaces [J].
Grabowski, SP ;
Schneider, M ;
Nienhaus, H ;
Mönch, W ;
Dimitrov, R ;
Ambacher, O ;
Stutzmann, M .
APPLIED PHYSICS LETTERS, 2001, 78 (17) :2503-2505
[8]   Field-emission characteristics and large current density of heavily Si-doped AlN and AlxGa1-xN (0.38≤x<1) [J].
Kasu, M ;
Kobayashi, N .
APPLIED PHYSICS LETTERS, 2001, 79 (22) :3642-3644
[9]   PROPERTIES AND ION-IMPLANTATION OF ALXGA1-XN EPITAXIAL SINGLE-CRYSTAL FILMS PREPARED BY LOW-PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION [J].
KHAN, MA ;
SKOGMAN, RA ;
SCHULZE, RG ;
GERSHENZON, M .
APPLIED PHYSICS LETTERS, 1983, 43 (05) :492-494
[10]   Field emission study of gated GaN and Al0.1Ga0.9N/GaN pyramidal field emitter arrays [J].
Kozawa, T ;
Ohwaki, T ;
Taga, Y ;
Sawaki, N .
APPLIED PHYSICS LETTERS, 1999, 75 (21) :3330-3332