Surface diffusion of Pb single adatoms on the Si(111)-(√3x√3)R30°- Pb system

被引：10

作者：

Brihuega, I. ^{[1
]}

Ugeda, M. M. ^{[1
]}

Gomez-Rodriguez, J. M. ^{[1
]}

机构：

[1] Univ Autonoma Madrid, Dept Fis Mat Condensada, E-28049 Madrid, Spain

来源：

PHYSICAL REVIEW B | 2007年 / 76卷 / 03期

关键词：

D O I：

10.1103/PhysRevB.76.035422

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The adsorption and diffusion of additional Pb adatoms on the 1/3 monolayer Si(111)-(root 3x root 3)R30 degrees-Pb surface have been investigated by means of variable temperature scanning tunneling microscopy experiments. This surface experiences a reversible phase transition to a (3x3) symmetry at a critical temperature T-c=86 K. Scanning tunneling microscope (STM) images, acquired below and above T-c, have allowed us to identify the nature and adsorption sites of the additional Pb adatoms. A careful analysis of the diffusion, in which the influence of the STM in the measurements has been addresed and discarded, has been performed at temperatures well below room temperature but above T-c. In this way, the activation energy and the preexponential factor for the surface diffusion of single Pb adatoms on the high temperature (root 3x root 3)R30 degrees phase have been obtained. Attention has been paid to the role played by the underlying (3x3) phase at these temperatures.

引用

页数：6

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