Nonlocal electron kinetics in a planar inductive helium discharge

被引:77
作者
Seo, SH [1 ]
Chung, CW [1 ]
Hong, JI [1 ]
Chang, HY [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea
来源
PHYSICAL REVIEW E | 2000年 / 62卷 / 05期
关键词
D O I
10.1103/PhysRevE.62.7155
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A measurement of the electron energy distribution function (EEDF) using the ac superposition method is done over a helium pressure range of 10-100 mTorr in a planar inductive plasma, and the electron energy diffusion coefficient which describes the electron heating is calculated based on the same discharge conditions using a two-dimensional simulation. It is found that the measured EEDF shows a bi-Maxwellian distribution with a low-energy electron group at low pressures below 20 mTorr even in the inductive discharge using helium of the non-Ramsauer gas. The major factors which can affect the EEDF formation are investigated. In particular, the concept of the total electron bounce frequency, i.e., the electron residence time, is introduced as an indicator of how the electron-electron collision affects the EEDF shape. As a result, it is shown that the observed bi-Maxwellian distribution at low pressures is attributed to the combined effects of the formation of low-energy electrons through the cooling mechanism of energetic electrons enhanced by the capacitive field, the low heating rate of the low-energy electrons, the confinement of low-energy electrons by the ambipolar space potential, and the low electron-electron collision frequency which can be estimated from the total electron bounce frequency presented in this paper.
引用
收藏
页码:7155 / 7167
页数:13
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