Richardson's constant in inhomogeneous silicon carbide Schottky contacts

被引:214
作者
Roccaforte, F
La Via, F
Raineri, V
Pierobon, R
Zanoni, E
机构
[1] CNR, IMM, Sez Catania, I-95121 Catania, Italy
[2] Univ Padua, Dept Informat Engn, I-35131 Padua, Italy
关键词
D O I
10.1063/1.1573750
中图分类号
O59 [应用物理学];
学科分类号
摘要
The electrical characterization of nickel silicide Schottky contacts on silicon carbide (4H-SiC) is reported in this article. In spite of the nearly ideal behavior of the contact at room temperature (n=1.05), the electrical behavior monitored in a wide temperature range exhibited a deviation from the ideality at lower temperatures, thus suggesting that. an inhomogeneous barrier has actually formed. A description of the experimental results by the Tung's model, i.e., considering an effective area of the inhomogeneous contact, provided a procedure for a correct determination of the Richardson's constant A**. An effective area lower than the geometric area of the diode is responsible for the commonly observed discrepancy in the experimental values of A** from its theoretical value in silicon carbide. The same method was applied to Ti/4H-SiC contacts. (C) 2003 American Institute of Physics.
引用
收藏
页码:9137 / 9144
页数:8
相关论文
共 33 条
  • [1] Electron transport at Au/InP interface with nanoscopic exclusions
    Anand, S
    Carlsson, SB
    Deppert, K
    Montelius, L
    Samuelson, L
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (04): : 2794 - 2798
  • [2] OBSERVATION OF INTERFACE BAND-STRUCTURE BY BALLISTIC-ELECTRON-EMISSION MICROSCOPY
    BELL, LD
    KAISER, WJ
    [J]. PHYSICAL REVIEW LETTERS, 1988, 61 (20) : 2368 - 2371
  • [3] Effect of surface inhomogeneities on the electrical characteristics of SiC Schottky contacts
    Bhatnagar, M
    Baliga, BJ
    Kirk, HR
    Rozgonyi, GA
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1996, 43 (01) : 150 - 156
  • [4] Bozack MJ, 1997, PHYS STATUS SOLIDI B, V202, P549, DOI 10.1002/1521-3951(199707)202:1<549::AID-PSSB549>3.0.CO
  • [5] 2-6
  • [6] Barrier inhomogeneities and electrical characteristics of Ti/4H-SiC Schottky rectifiers
    Defives, D
    Noblanc, O
    Dua, C
    Brylinski, C
    Barthula, M
    Aubry-Fortuna, V
    Meyer, F
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1999, 46 (03) : 449 - 455
  • [7] NITROGEN DONORS IN 4H-SILICON CARBIDE
    GOTZ, W
    SCHONER, A
    PENSL, G
    SUTTROP, W
    CHOYKE, WJ
    STEIN, R
    LEIBENZEDER, S
    [J]. JOURNAL OF APPLIED PHYSICS, 1993, 73 (07) : 3332 - 3338
  • [8] SCHOTTKY-BARRIER ON N-TYPE GAN GROWN BY HYDRIDE VAPOR-PHASE EPITAXY
    HACKE, P
    DETCHPROHM, T
    HIRAMATSU, K
    SAWAKI, N
    [J]. APPLIED PHYSICS LETTERS, 1993, 63 (19) : 2676 - 2678
  • [9] Effect of interfacial reactions on electrical properties of Ni contacts on lightly doped n-type 4H-SiC
    Han, SY
    Lee, JL
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2002, 149 (03) : G189 - G193
  • [10] Nanometer-scale test of the Tung model of Schottky-barrier height inhomogeneity
    Im, HJ
    Ding, Y
    Pelz, JP
    Choyke, WJ
    [J]. PHYSICAL REVIEW B, 2001, 64 (07)