Laser-Direct Patterning of Nanostructured Metal Thin Films

被引:9
作者
Shin, Hyunkwon [1 ]
Lee, Hyeongjae [1 ]
Yoo, Hyeonggeun [1 ]
Lim, Ki-Soo [2 ]
Lee, Myeongkyu [1 ]
机构
[1] Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
[2] Chungbuk Univ, Dept Phys, Cheongju 361763, South Korea
来源
KOREAN JOURNAL OF METALS AND MATERIALS | 2010年 / 48卷 / 02期
关键词
thin films; metals; nanostructured materials; scanning electron microscopy; microstructurds; FIELD-EFFECT TRANSISTORS; SILICON-WAFERS; DEPOSITION; PARTICLES; SURFACES; REMOVAL;
D O I
10.3365/KJMM.2010.48.02.163
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We here describe the laser-direct patterning of nanostructured metal thin films. This method involves light-matter interaction in which a pulsed laser beam impinging on the film generates a thermo-elastic force that plays a role to detach the film from the substrate or underlying layers. A moderate cohesion of the nanostructured film enables localized desorption of the material upon irradiation by a spatially-modulated laser beam, giving good fidelity with the transfered pattern. This photoresist-free process provides a simple high-resolution scheme for patterning metal thin films.
引用
收藏
页码:163 / 168
页数:6
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