Controlling the compositional inhomogeneities in AlxGa1-xN/AlGa1-yN MQWs grown by PA-MBE: Effect on luminescence properties

被引:17
作者
Pramanik, Pallabi [1 ]
Sen, Sayantani [1 ]
Singha, Chirantan [1 ]
Roy, Abhra Shankar [1 ]
Das, Alakananda [2 ]
Sen, Susanta [2 ]
Bhattacharyya, Anirban [2 ]
Kumar, Deepak [3 ]
Rao, D. V. Sridhara [3 ]
机构
[1] Univ Calcutta, Ctr Res Nanosci & Nanotechnol, JD2 Sect 3 Salk Lake City, Kolkata 700098, W Bengal, India
[2] Univ Calcutta, Inst Radio Phys & Elect, 92 APC Rd, Kolkata 700009, W Bengal, India
[3] Def Met Res Lab, Electron Microscopy Grp, Hyderabad 500058, Andhra Pradesh, India
关键词
Characterization; Molecular beam epitaxy; Quantum wells; Nitrides; Semiconducting III-V materials; MOLECULAR-BEAM EPITAXY; INDIUM-SURFACTANT; GALLIUM NITRIDE; ALGAN ALLOYS; ASSISTED MBE; GAN; FILMS;
D O I
10.1016/j.jcrysgro.2016.01.004
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Al0.35Ga0.65N/Al0.55Ga0.45N MQWs were grown by PA-MBE using a range of group III/V flux ratios. TEM images indicate sharp interfaces and well/barrier widths of 1.5/2 nm. We observe that small variations of group III/V flux ratio cause dramatic variations in the room temperature photoluminescence (PL) spectra. In addition to band edge luminescence, multiple low energy PL peaks are observed for growths under excess group III conditions, which are absent for near-stoichiometric growth. Temperature dependent PL measurements indicate that at room temperature, emission occurs due to transitions at potential fluctuations generated by the presence of compositional inhomogeneity. These effects are dominant for growth under excess group III conditions due to the presence of a metallic layer on the growth surface during deposition. This can be eliminated by the use of an Indium surfactant during growth, which modifies the diffusion length of Ga and Al adatoms. Under these conditions, the optical properties of MQWs are relatively insensitive to variations in group III to V flux ratio and hence substrate temperature, thus making them suitable for industrial-scale fabrication of optoelectronic devices in the ultraviolet range. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:60 / 65
页数:6
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