Controlling the compositional inhomogeneities in AlxGa1-xN/AlGa1-yN MQWs grown by PA-MBE: Effect on luminescence properties

被引:17
作者
Pramanik, Pallabi [1 ]
Sen, Sayantani [1 ]
Singha, Chirantan [1 ]
Roy, Abhra Shankar [1 ]
Das, Alakananda [2 ]
Sen, Susanta [2 ]
Bhattacharyya, Anirban [2 ]
Kumar, Deepak [3 ]
Rao, D. V. Sridhara [3 ]
机构
[1] Univ Calcutta, Ctr Res Nanosci & Nanotechnol, JD2 Sect 3 Salk Lake City, Kolkata 700098, W Bengal, India
[2] Univ Calcutta, Inst Radio Phys & Elect, 92 APC Rd, Kolkata 700009, W Bengal, India
[3] Def Met Res Lab, Electron Microscopy Grp, Hyderabad 500058, Andhra Pradesh, India
关键词
Characterization; Molecular beam epitaxy; Quantum wells; Nitrides; Semiconducting III-V materials; MOLECULAR-BEAM EPITAXY; INDIUM-SURFACTANT; GALLIUM NITRIDE; ALGAN ALLOYS; ASSISTED MBE; GAN; FILMS;
D O I
10.1016/j.jcrysgro.2016.01.004
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Al0.35Ga0.65N/Al0.55Ga0.45N MQWs were grown by PA-MBE using a range of group III/V flux ratios. TEM images indicate sharp interfaces and well/barrier widths of 1.5/2 nm. We observe that small variations of group III/V flux ratio cause dramatic variations in the room temperature photoluminescence (PL) spectra. In addition to band edge luminescence, multiple low energy PL peaks are observed for growths under excess group III conditions, which are absent for near-stoichiometric growth. Temperature dependent PL measurements indicate that at room temperature, emission occurs due to transitions at potential fluctuations generated by the presence of compositional inhomogeneity. These effects are dominant for growth under excess group III conditions due to the presence of a metallic layer on the growth surface during deposition. This can be eliminated by the use of an Indium surfactant during growth, which modifies the diffusion length of Ga and Al adatoms. Under these conditions, the optical properties of MQWs are relatively insensitive to variations in group III to V flux ratio and hence substrate temperature, thus making them suitable for industrial-scale fabrication of optoelectronic devices in the ultraviolet range. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:60 / 65
页数:6
相关论文
共 27 条
  • [1] Comparative study of GaN/AlGaN MQWs grown homoepitaxially on (1(1)over-bar-00) and (0001) GaN
    Bhattacharyya, A
    Friel, I
    Iyer, S
    Chen, TC
    Li, W
    Cabalu, J
    Fedyunin, Y
    Ludwig, KF
    Moustakas, TD
    Maruska, HP
    Hill, DW
    Gallagher, JJ
    Chou, MC
    Chai, B
    [J]. JOURNAL OF CRYSTAL GROWTH, 2003, 251 (1-4) : 487 - 493
  • [2] Deep ultraviolet emitting AlGaN quantum wells with high internal quantum efficiency
    Bhattacharyya, A.
    Moustakas, T. D.
    Zhou, Lin
    Smith, David. J.
    Hug, W.
    [J]. APPLIED PHYSICS LETTERS, 2009, 94 (18)
  • [3] Hamel Paradox and Rosenberg Conjecture in Analytical Dynamics
    Chen, Y. H.
    [J]. JOURNAL OF APPLIED MECHANICS-TRANSACTIONS OF THE ASME, 2013, 80 (04):
  • [4] Excitonic luminescence linewidths in AlGaN alloys with high aluminum concentrations
    Coli, G
    Bajaj, KK
    Li, J
    Lin, JY
    Jiang, HX
    [J]. APPLIED PHYSICS LETTERS, 2002, 80 (16) : 2907 - 2909
  • [5] Enhanced room-temperature luminescence efficiency through carrier localization in AlxGa1-xN alloys -: art. no. 031916
    Collins, CJ
    Sampath, AV
    Garrett, GA
    Sarney, WL
    Shen, H
    Wraback, M
    Nikiforov, AY
    Cargill, GS
    Dierolf, V
    [J]. APPLIED PHYSICS LETTERS, 2005, 86 (03) : 1 - 3
  • [6] Characterizations of GaN films grown with indium surfactant by RF-plasma assisted molecular beam epitaxy
    Fong, WK
    Zhu, CF
    Leung, BH
    Surya, C
    Sundaravel, B
    Luo, EZ
    Xu, JB
    Wilson, IH
    [J]. MICROELECTRONICS RELIABILITY, 2002, 42 (08) : 1179 - 1184
  • [7] Improvement of the photoluminescence from gallium nitride layers grown by MBE with an additional incident indium flux
    Foxon, CT
    Hooper, SE
    Cheng, TS
    Orton, JW
    Ren, GB
    Ber, BY
    Merkulov, AV
    Novikov, SV
    Tret'yakov, VV
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1998, 13 (12) : 1469 - 1471
  • [8] Growth kinetics of AlGaN films by plasma-assisted molecular-beam epitaxy
    Iliopoulos, E
    Moustakas, TD
    [J]. APPLIED PHYSICS LETTERS, 2002, 81 (02) : 295 - 297
  • [9] Chemical ordering in AlGaN alloys grown by molecular beam epitaxy
    Iliopoulos, E
    Ludwig, KF
    Moustakas, TD
    Chu, SNG
    [J]. APPLIED PHYSICS LETTERS, 2001, 78 (04) : 463 - 465
  • [10] GaN/AlN short-period superlattices for intersubband optoelectronics: A systematic study of their epitaxial growth, design, and performance
    Kandaswamy, P. K.
    Guillot, F.
    Bellet-Amalric, E.
    Monroy, E.
    Nevou, L.
    Tchernycheva, M.
    Michon, A.
    Julien, F. H.
    Baumann, E.
    Giorgetta, F. R.
    Hofstetter, D.
    Remmele, T.
    Albrecht, M.
    Birner, S.
    Dang, Le Si
    [J]. JOURNAL OF APPLIED PHYSICS, 2008, 104 (09)