Hysteretic metal-ferroelectric-semiconductor capacitors based on PZT/ZnO heterostructures

被引:41
作者
Cagin, E. [1 ]
Chen, D. Y. [1 ]
Siddiqui, J. J. [1 ]
Phillips, J. D. [1 ]
机构
[1] Univ Michigan, Elect Engn & Comp Sci Dept, Solid State Elect Lab, Ann Arbor, MI 48109 USA
关键词
D O I
10.1088/0022-3727/40/8/003
中图分类号
O59 [应用物理学];
学科分类号
摘要
Interfacing of ferroelectric and semiconductor materials provides a means of coupling unique properties associated with ferroelectric materials to high performance semiconductor devices. In this work we report the electronic properties of ferroelectric/ZnO heterostructures, where (Pb, Zr) TiO3 (PZT) is used as a prototypical ferroelectric oxide. Metal-PZT-metal structures demonstrate ferroelectric hysteresis with remanent polarization of 28 mu C cm(-2) and coercive field of 75 kV cm(-1) for a loop of 15V. The metal-PZT-ZnO capacitor structures demonstrate a characteristic metal-insulator-semiconductor capacitance-voltage (C-V) behaviour with a hysteretic memory window of approximately 4V. The heterostructure C-V characteristics do not change significantly with varying frequency. Metal-PZT-ZnO capacitors are also used as part of a simple RLC circuit to demonstrate the ability to shift resonant frequency of the circuit with switching ferroelectric polarization.
引用
收藏
页码:2430 / 2434
页数:5
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