Electron mobility in GaN

被引:0
作者
Dhar, S [1 ]
Ghosh, S [1 ]
机构
[1] Jawaharlal Nehru Univ, Sch Phys Sci, New Delhi 110067, India
来源
PROCEEDING OF THE TENTH INTERNATIONAL WORKSHOP ON THE PHYSICS OF SEMICONDUCTOR DEVICES, VOLS I AND II | 2000年 / 3975卷
关键词
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Electron mobility in GaN have been studied experimentally and theoretically. All important scattering mechanisms, i.e. impurity, polar optical phonon, acoustic-phonon, piezoelectric, and dislocation are included in the calculation. It has been found that extended defects, like dislocation plays important role on the mobility of electron in GaN. Ionized impurity scattering has been treated beyond the Born approximation using a phase-shift analysis. The compensation ratio is used as a parameter with a realistic charge neutrality condition. Comparisons with experimental data confirm the present calculation over a wide range of temperatures. Mobility and electron concentration data from Ball measurements reveal a degenerate layer either due to disordered interface layer or due to impurity band.
引用
收藏
页码:157 / 164
页数:8
相关论文
共 9 条
  • [1] Low field electron mobility in GaN
    Dhar, S
    Ghosh, S
    [J]. JOURNAL OF APPLIED PHYSICS, 1999, 86 (05) : 2668 - 2676
  • [2] Comparison of high field electron transport in GaN and GaAs
    Foutz, BE
    Eastman, LF
    Bhapkar, UV
    Shur, MS
    [J]. APPLIED PHYSICS LETTERS, 1997, 70 (21) : 2849 - 2851
  • [3] Influence of sapphire nitridation on properties of gallium nitride grown by metalorganic chemical vapor deposition
    Keller, S
    Keller, BP
    Wu, YF
    Heying, B
    Kapolnek, D
    Speck, JS
    Mishra, UK
    DenBaars, SP
    [J]. APPLIED PHYSICS LETTERS, 1996, 68 (11) : 1525 - 1527
  • [4] GROWTH BY MOLECULAR-BEAM EPITAXY AND ELECTRICAL CHARACTERIZATION OF SI-DOPED ZINC BLENDE GAN FILMS DEPOSITED ON BETA-SIC COATED (001) SI SUBSTRATES
    KIM, JG
    FRENKEL, AC
    LIU, H
    PARK, RM
    [J]. APPLIED PHYSICS LETTERS, 1994, 65 (01) : 91 - 93
  • [5] IONIZED-IMPURITY SCATTERING IN THE STRONG-SCREENING LIMIT
    MEYER, JR
    BARTOLI, FJ
    [J]. PHYSICAL REVIEW B, 1987, 36 (11): : 5989 - 6000
  • [6] PHASE-SHIFT CALCULATION OF IONIZED IMPURITY SCATTERING IN SEMICONDUCTORS
    MEYER, JR
    BARTOLI, FJ
    [J]. PHYSICAL REVIEW B, 1981, 23 (10): : 5413 - 5427
  • [7] Nakamura S., 1997, BLUE LASER DIODE GAN
  • [8] The role of dislocation scattering in n-type GaN films
    Ng, HM
    Doppalapudi, D
    Moustakas, TD
    Weimann, NG
    Eastman, LF
    [J]. APPLIED PHYSICS LETTERS, 1998, 73 (06) : 821 - 823
  • [9] Direct measurements of electron-longitudinal optical phonon scattering rates in wurtzite GaN
    Tsen, KT
    Ferry, DK
    Botchkarev, A
    Sverdlov, B
    Salvador, A
    Morkoc, H
    [J]. APPLIED PHYSICS LETTERS, 1997, 71 (13) : 1852 - 1853