Post-processing techniques for locally self-assembled silicon nanowires

被引:15
作者
Englander, Ongi [1 ]
Christensen, Dane
Kim, Jongbaeg
Lin, Liwei
机构
[1] Univ Calif Berkeley, Berkeley Sensor & Acturator Ctr, Berkeley, CA 94720 USA
[2] Yonsei Univ, Sch Mech Engn, Seoul, South Korea
基金
美国国家科学基金会;
关键词
NEMS; silicon nanowires; integration; post-processing;
D O I
10.1016/j.sna.2006.08.004
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Post-processing techniques are applied after the integration and assembly of nanostructures and Microelectromechanical Systems (MEMS) to realize integrated Nanoelectromechanical Systems (NEMS). Experimentation is focused specifically on the application of post-processing steps to a locally self-assembled micro-to-nano system comprising of suspended silicon nanowires between two MEMS bridges. Local contact metallization, global metallization for rapid system functionalization and the application of aqueous treatment to the NEMS are among the post-processing techniques studied. These techniques are evaluated for their effectiveness and compatibility with integrated NEMS and traditional MEMS processes. It is found that local and global contact metallization techniques effectively alleviate inherent problems at the nano-to-micro contact and the aqueous treatment study confirms the effectiveness of the super critical drying process for nanostructures. (C) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:10 / 15
页数:6
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