First-principles simulations of dissociated and molecular hydrogen adsorption on silicon oxide clusters

被引:3
|
作者
Zhao, Gao-feng [1 ]
Zhi, Li-li [2 ]
Zhang, Wen-qing [3 ]
Sun, Jian-min [1 ]
Shen, Xue-feng [1 ]
Wang, Yuan-xu [1 ]
机构
[1] Henan Univ, Inst Computat Mat Sci, Kaifeng 475004, Peoples R China
[2] Changji Univ, Dept Phys, Changji 831100, Peoples R China
[3] Henan Inst Sci & Technol, Sch Mech & Elect, Xinxiang 453003, Peoples R China
来源
JOURNAL OF MOLECULAR STRUCTURE-THEOCHEM | 2010年 / 941卷 / 1-3期
基金
美国国家科学基金会;
关键词
Cluster; DFT; Structure; Adsorption; RESONANCE MASS-SPECTROMETRY; AB-INITIO; PHASE; SI2O2; SIO2;
D O I
10.1016/j.theochem.2009.11.005
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Equilibrium geometries, adsorption energies, and electronic properties of a hydrogen molecule on Si(3)O(n) (n = 1-6) clusters have been investigated using density functional theory. The hydrogen molecule preferably dissociates and all H atoms bind to the 2-fold coordinated Si atom with dangling bonds in nearly a fixed direction for the smaller clusters. The dissociated H atoms favor binding to the terminal no-bridged O atoms to form the SiOH radical in the rhombus Chain structures as the oxygen contents increase. We also report the interaction between Si(3)O(4) cluster and multi-H(2) molecules. Our results show that, at first, the added hydrogen molecules tend to dissociate and neutralize the dangling bonds. After all the dangling bonds are neutralized, the hydrogen begins to adsorb on the complex in molecules with a small adsorption energy. In addition, the infrared and Raman spectra are valuable in distinguishing among adsorption and dissociation of the H(2) molecules on silicon oxide. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:71 / 77
页数:7
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