Enhanced diffusion upon amorphous-to-nanocrystalline phase transition in Mo/B4C/Si layered systems

被引：17

作者：

de Rooij-Lohmann, V. I. T. A. ^{[1
]}

Yakshin, A. E. ^{[1
]}

van de Kruijs, R. W. E. ^{[1
]}

Zoethout, E. ^{[1
]}

Kleyn, A. W. ^{[1
]}

Keim, E. G. ^{[2
]}

Gorgoi, M. ^{[3
]}

Schaefers, F. ^{[3
]}

Brongersma, H. H. ^{[4
]}

Bijkerk, F. ^{[1
,2
]}

机构：

[1] FOM Inst Plasma Phys Rijnhuizen, NL-3430 BE Nieuwegein, Netherlands

[2] Univ Twente, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands

[3] Helmholtz Zentrum Berlin Mat & Energie GmbH, BESSY 2, D-12489 Berlin, Germany

[4] Tascon GmbH, D-48149 Munster, Germany

来源：

JOURNAL OF APPLIED PHYSICS | 2010年 / 108卷 / 01期

关键词：

MOLYBDENUM; MULTILAYERS; INTERFACE; SILICIDE; CARBIDE; FILMS;

D O I：

10.1063/1.3460107

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effect of an amorphous-to-nanocrystalline phase transition on the diffusion across an interface layer of subnanometer thickness has been investigated in real-time. The diffusion in the Mo/B4C/Si thin film structure studied was found to instantaneously enhance by an order of magnitude upon the formation of nanocrystals inducing the atomic-scale onset of grain boundary diffusion. (C) 2010 American Institute of Physics. [doi:10.1063/1.3460107]

引用

页数：5

共 21 条

[1] Thermal stability of Mo/Si multilayers with boron carbide interlayers [J].

Böttger, T ;

Meyer, DC ;

Paufler, P ;

Braun, S ;

Moss, M ;

Mai, H ;

Beyer, E .

THIN SOLID FILMS, 2003, 444 (1-2) :165-173

[2] XPS STUDY OF THE ADHERENCE OF REFRACTORY CARBIDE, SILICIDE, AND BORIDE RF-SPUTTERED WEAR-RESISTANT COATINGS [J].

BRAINARD, WA ;

WHEELER, DR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (06) :1800-1805

[3] Surface composition analysis by low-energy ion scattering [J].

Brongersma, H. H. ;

Draxler, M. ;

de Ridder, M. ;

Bauer, P. .

SURFACE SCIENCE REPORTS, 2007, 62 (03) :63-109

[4] The effect of Mo crystallinity on diffusion through the Si-on-Mo interface in EUV multilayer systems [J].

Bruijn, S. ;

van de Kruijs, R. W. E. ;

Yakshin, A. E. ;

Bijkerk, F. .

DIFFUSION IN SOLIDS AND LIQUIDS IV, 2009, 283-286 :657-661

[5] Diffusion and interaction studied nondestructively and in real-time with depth-resolved low energy ion spectroscopy [J].

de Rooij-Lohmann, V. I. T. A. ;

Kleyn, A. W. ;

Bijkerk, F. ;

Brongersma, H. H. ;

Yakshin, A. E. .

APPLIED PHYSICS LETTERS, 2009, 94 (06)

[6] PHASE FORMATION DURING REACTIVE MOLYBDENUM-SILICIDE FORMATION [J].

DOLAND, CM ;

NEMANICH, RJ .

JOURNAL OF MATERIALS RESEARCH, 1990, 5 (12) :2854-2864

[7] Velocity scaling of ion neutralization in low energy ion scattering [J].

Draxler, M ;

Gruber, R ;

Brongersma, HH ;

Bauer, P .

PHYSICAL REVIEW LETTERS, 2002, 89 (26) :1-263201

[8] The high kinetic energy photoelectron spectroscopy facility at BESSY progress and first results [J].

Gorgoi, M. ;

Svensson, S. ;

Schaefers, F. ;

Ohrwall, G. ;

Mertin, M. ;

Bressler, P. ;

Karis, O. ;

Siegbahn, H. ;

Sandell, A. ;

Rensmo, H. ;

Doherty, W. ;

Jung, C. ;

Braun, W. ;

Eberhardt, W. .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2009, 601 (1-2) :48-53

[9] Subnanometer-scale measurements of the interaction of ultrafast soft X-ray free-electron-laser pulses with matter [J].

Hau-Riege, Stefan P. ;

Chapman, Henry N. ;

Krzywinski, Jacek ;

Sobierajski, Ryszard ;

Bajt, Sasa ;

London, Richard A. ;

Bergh, Magnus ;

Caleman, Carl ;

Nietubyc, Robert ;

Juha, Libor ;

Kuba, Jaroslav ;

Spiller, Eberhard ;

Baker, Sherry ;

Bionta, Richard ;

Tinten, K. Sokolowski ;

Stojanovic, Nikola ;

Kjornrattanawanich, Benjawan ;

Gullikson, Eric ;

Ploenjes, Elke ;

Toleikis, Sven ;

Tschentscher, Thomas .

PHYSICAL REVIEW LETTERS, 2007, 98 (14)

[10] INTERFACIAL REACTIONS ON ANNEALING MOLYBDENUM-SILICON MULTILAYERS [J].

HOLLOWAY, K ;

DO, KB ;

SINCLAIR, R .

JOURNAL OF APPLIED PHYSICS, 1989, 65 (02) :474-480

← 1 2 3 →