The optimization of a self-focusing e-beam evaporator for carbon evaporation and the application for graphene growth

被引：2

作者：

Chen, S. ^{[1
]}

Fan, L. L. ^{[1
]}

Wang, J. ^{[1
]}

Pan, Y. ^{[1
]}

Chen, F. H. ^{[1
]}

Xu, P. S. ^{[1
]}

Zou, C. W. ^{[1
]}

Wu, Z. Y. ^{[1
,2
]}

机构：

[1] Univ Sci & Technol China, Natl Synchrotron Radiat Lab, Hefei 230029, Peoples R China

[2] Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China

来源：

SURFACE & COATINGS TECHNOLOGY | 2014年 / 258卷

基金：

中国国家自然科学基金;

关键词：

graphene; E-beam evaporator; Electric field; Molecular beam epitaxy;

D O I：

10.1016/j.surfcoat.2014.07.009

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A self-focusing e-beam evaporator for carbon flux source in a molecular beam epitaxy (MBE) system has been designed and optimized. It is found that the configuration of the e-beam evaporator is very important for the solid carbon evaporation. According to the electric field simulation and the followed suitable design, the self-focusing e-beam evaporator for carbon flux evaporation can be achieved with high efficiency and good stability. This easy designed e-beam evaporator is adopted to produce stable and controllable carbon flux in a MBE system for large-area graphene layers preparation, which shows promising application for graphene-based device fabrication in the future. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：1196 / 1201

页数：6

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