Small-signal analysis of semiconductor heterojunctions with interacting interface states

被引:3
作者
Schmeits, M
机构
[1] Institute of Physics, University of Liège
关键词
D O I
10.1088/0268-1242/12/10/007
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A small-signal analysis of electrical conduction is given for semiconductor heterojunctions with a continuous density of states distribution inside the gap. The defect states are supposed to fully interact, such that their occupation can be described by a Fermi function with a quasi-fermi energy for non-equilibrium situations. After numerical integration of Poisson's equation and the continuity equations for electrons, holes and defect states one obtains the capacitance-frequency and conductance-frequency characteristics, depending on defect concentration, density of states function, temperature and applied voltage. Application to a InGaAs/lnP heterojunction shows characteristic features due to the presence of interface states. The analysis illustrates the differences with the case of discrete interface states, continuous distributions of non-interacting states, and of bulk defects.
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收藏
页码:1217 / 1225
页数:9
相关论文
共 17 条
[1]   A THEORY OF THE ADMITTANCE OF AN AMORPHOUS-SILICON SCHOTTKY-BARRIER [J].
ARCHIBALD, IW ;
ABRAM, RA .
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1983, 48 (02) :111-125
[2]   CAPACITANCE OF P-N HETEROJUNCTIONS INCLUDING EFFECTS OF INTERFACE STATES [J].
DONNELLY, JP ;
MILNES, AG .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1967, ED14 (02) :63-+
[3]   ELECTRON-HOLE RECOMBINATION IN GERMANIUM [J].
HALL, RN .
PHYSICAL REVIEW, 1952, 87 (02) :387-387
[4]   Single-level interface states in semiconductor structures investigated by admittance spectroscopy [J].
Krispin, P .
APPLIED PHYSICS LETTERS, 1997, 70 (11) :1432-1434
[6]   MEASUREMENT OF THE DENSITY OF GAP STATES IN HYDROGENATED AMORPHOUS-SILICON BY SPACE-CHARGE SPECTROSCOPY [J].
LANG, DV ;
COHEN, JD ;
HARBISON, JP .
PHYSICAL REVIEW B, 1982, 25 (08) :5285-5320
[7]  
LEU LY, 1989, J APPL PHYS, V65, P481
[8]  
MAWBY PA, 1991, IEE MAT DEVICES SERI, V8, P53
[10]   MOS CONDUCTANCE TECHNIQUE FOR MEASURING SURFACE STATE PARAMETERS (SIO2-SI E) [J].
NICOLLIAN, EH ;
GOETZBERGER, A .
APPLIED PHYSICS LETTERS, 1965, 7 (08) :216-+