Recessed AlGaN/GaN Schottky Barrier Diodes With TiN and NiN Dual Anodes

被引:16
作者
Wang, Ting-Ting [1 ]
Wang, Xiao [1 ]
He, Yue [1 ]
Jia, Mao [1 ]
Ye, Qiong [1 ]
Xu, Yang [1 ]
Zhang, Yi-Han [1 ]
Li, Yang [1 ]
Bai, Li-Hua [2 ]
Ma, Xiao-Hua [1 ]
Hao, Yue [1 ]
Ao, Jin-Ping [1 ,3 ]
机构
[1] Xidian Univ, Sch Microelect, Natl Key Discipline Lab Wide Bandgap Semicond, Xian 710071, Peoples R China
[2] Xian Shiyou Univ, Sch Sci, Xian 710065, Peoples R China
[3] Univ Tokushima, Inst Sci & Technol, Tokushima 7708506, Japan
基金
中国国家自然科学基金;
关键词
Anodes; Tin; Wide band gap semiconductors; Aluminum gallium nitride; Metals; MODFETs; HEMTs; AlGaN; GaN Schottky barrier diode (SBD); breakdown voltage (BV); dual metal nitride anode; recess structure; turn-on voltage; REVERSE-BLOCKING; BREAKDOWN; SILICON;
D O I
10.1109/TED.2021.3071296
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High-performance AlGaN/GaN lateral Schottky barrier diodes (SBDs) with recess structure and dual metal nitride anodes were demonstrated. With high work-function and nonrecess structure, a NiN anode enhances the breakdown voltage (BV), while a TiN anode reduces the turn-on voltage (V-ON) due to its low work-function and contact to the two-dimensional electron gas (2DEG) layer directly on a recess structure. As the length of the NiN anode (L-r) on the nonrecess region decreases from 75 to 3 mu m, V-ON is reduced from 0.56 to 0.30 V, while the reverse leakage current slightly increases from 3 x 10(-4) to 2 x 10(-3) A/cm(2) at the bias of -10 V. The lateral AlGaN/GaN SBD with a L-r of 3 mu m at a distance of cathode-anode (LAC) of 20 mu m achieves a high BV of 1.62 kV, an ultralow V-ON of 0.30 V and a small capacitance of 6.0 pF at zero bias with little degradation on ON-resistance, indicating superior potential application in high-frequency and high-power devices.
引用
收藏
页码:2867 / 2871
页数:5
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