Effect of anode designs on ion emission characteristics of a plasma focus device

被引:45
作者
Mohanty, Smruti Ranjan [1 ]
Neog, Nirod Kumar
Bhuyan, Heman
Rout, Rabindra Kumar
Rawat, Rajdeep Singh
Lee, Paul
机构
[1] Ctr Plasma Phys, Kamrup 782402, Assam, India
[2] Bhabha Atom Res Ctr, Appl Phys Sect, Bombay 400085, Maharashtra, India
[3] Nanyang Technol Univ, Natl Inst Educ, Singapore 637616, Singapore
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2007年 / 46卷 / 5A期
关键词
plasma focus; Faraday cup; nitrogen ion beam;
D O I
10.1143/JJAP.46.3039
中图分类号
O59 [应用物理学];
学科分类号
摘要
A comparative study on the ion emission characteristics such as flux and energy, and their variation in angular positions and operating gas pressures has been carried out in a nitrogen-filling plasma focus device. Three different designs of cylindrical anode (central electrode) having hollow, solid and hemispherical tip have been tested for this study. The ion emission characteristics were investigated by employing three Faraday cups at various angular positions. The ion flux depends on the operating gas pressure irrespective of the anode designs and the maximum ion flux is found to be in the pressure range 0.3 to 0.5 Torr for all the anode designs. The hemispherical anode yields highest ion flux while the hollow anode emits lowest ion flux. The angular variation of ion flux is seen to be anisotropic irrespective of the anode designs with an ion dip at 0 degrees (axis of the device) and maximal at 5 degrees angular positions. The anisotropic character of ion emission is less in the case of the hemispherical anode than the hollow anode. The ion energy, measured by the time of flight method, shows its dependence on the anode designs. The maximum ion energy is found to be around 830 keV at an angular position 5 degrees in the case of the hemispherical anode design. The most probable ions are found to be with energy less than 100 keV irrespective of the anode designs and the angular positions. This study indicates that the plasma focus device could be optimized to a great extent for optimal ions yield by using an appropriate anode design.
引用
收藏
页码:3039 / 3044
页数:6
相关论文
共 33 条
[21]   Application of laser ion source for ion implantation technology [J].
Rosinski, M ;
Badziak, J ;
Boody, FP ;
Gammino, S ;
Hora, H ;
Krása, J ;
Láska, L ;
Mezzasalma, AM ;
Parys, P ;
Rohlena, K ;
Torrisi, L ;
Ullschmied, J ;
Wolowski, J ;
Woryna, E .
VACUUM, 2005, 78 (2-4) :435-438
[22]   ION EMISSION FROM PLASMA-FOCUS FACILITIES [J].
SADOWSKI, M ;
ZEBROWSKI, J ;
RYDYGIER, E ;
KUCINSKI, J .
PLASMA PHYSICS AND CONTROLLED FUSION, 1988, 30 (06) :763-769
[23]  
Sadowski M, 2000, NUKLEONIKA, V45, P199
[24]  
Sadowski M, 2000, NUKLEONIKA, V45, P179
[25]   Formation of CNx thin films by reactive pulsed laser deposition assisted by electron cyclotron resonance microwave discharge [J].
Shi, W ;
Wu, JD ;
Sun, J ;
Ling, H ;
Ying, ZF ;
Ding, XM ;
Zhou, ZY ;
Li, FM .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2001, 73 (05) :605-608
[26]   Diode like behaviour of an ion irradiated polyaniline film [J].
Srivastava, MP ;
Mohanty, SR ;
Annapoorni, S ;
Rawat, RS .
PHYSICS LETTERS A, 1996, 215 (1-2) :63-68
[27]   PARTICLE BEAMS GENERATED BY A6-12.5 KJ DENSE-PLASMA FOCUS [J].
STYGAR, W ;
GERDIN, G ;
VENNERI, F ;
MANDREKAS, J .
NUCLEAR FUSION, 1982, 22 (09) :1161-1172
[28]   Formation of β-FeSi2 by implanting multicharged iron ions produced in an ECR ion source [J].
Tomida, M ;
Kato, Y ;
Asaji, T .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2005, 237 (1-2) :83-87
[29]   ION-BEAM-INDUCED ELECTRICAL-CONDUCTIVITY IN PLASMA-POLYMERIZED ANILINE FILM [J].
TONG, ZS ;
WU, MZ ;
PU, TS ;
ZHOU, F ;
LIU, HZ .
SYNTHETIC METALS, 1995, 68 (02) :125-131
[30]   A TRANSMISSION ELECTRON-MICROSCOPY STUDY ON TI-N FILMS DEPOSITED BY ION PLATING [J].
WEN, LS ;
JIANG, X ;
SI, CY .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2682-2685