Single-trap analysis of hot-carrier-induced gate oxide degradation in Flash memory cells

被引:3
|
作者
Tkachev, Yuri [1 ]
Kotov, Alexander [1 ]
机构
[1] Silicon Storage Technol Inc, 450 Holger Way, San Jose, CA 95134 USA
关键词
Flash memory; SuperFlash; Non-volatile memory; Floating gate; Hot electron; Oxide degradation; Charge trapping; Single electron;
D O I
10.1016/j.mee.2017.04.034
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Using a test structure containing two memory cells with a shared floating gate (FG), we analyzed the processes of hot-electron-induced charge trapping in the FG oxide with a single-trap resolution. Unlike the traditional RTNbased method for single-trap study, the proposed approach allows one to detect not only the interface traps showing capture-emission events in the time domain, but also to resolve virtually all individual trapping-detrapping events in the floating gate oxide during the program-erase cycling. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:71 / 75
页数:5
相关论文
共 50 条
  • [1] A Differential Method for Analysis of Hot-Electron Degradation in Floating-Gate Memory Cells with a Single-Trap Resolution
    Tkachev, Yuri
    Yoo, Jong-Won
    2014 IEEE INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP FINAL REPORT (IIRW), 2014, : 90 - 93
  • [2] ANALYSIS ON GATE-OXIDE THICKNESS DEPENDENCE OF HOT-CARRIER-INDUCED DEGRADATION IN THIN-GATE OXIDE NMOSFETS
    TOYOSHIMA, Y
    IWAI, H
    MATSUOKA, F
    HAYASHIDA, H
    MAEGUCHI, K
    KANZAKI, K
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1990, 37 (06) : 1496 - 1503
  • [3] HOT-CARRIER-INDUCED DEGRADATION IN NITRIDED OXIDE MOSFETS
    GUPTA, A
    PRADHAN, S
    ROENKER, KP
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (03) : 577 - 588
  • [4] Gate-oxide thickness effects on hot-carrier-induced degradation in n-MOSFETs
    Gu, Y
    Yuan, JS
    INTERNATIONAL JOURNAL OF ELECTRONICS, 1998, 85 (01) : 1 - 9
  • [5] Gate-oxide thickness effects on hot-carrier-induced degradation in n-MOSFETs
    Gu, YH
    Yuan, JS
    PROCEEDINGS OF THE IEEE SOUTHEASTCON '96: BRINGING TOGETHER EDUCATION, SCIENCE AND TECHNOLOGY, 1996, : 665 - 669
  • [6] Hot-carrier-induced on-resistance degradation of step gate oxide NLDMOS附视频
    韩雁
    张斌
    丁扣宝
    张世峰
    韩成功
    胡佳贤
    朱大中
    半导体学报, 2010, (12) : 49 - 53
  • [7] Gate-oxide thickness effects on hot-carrier-induced degradation in n-MOSFETs
    Gu, Y
    Yuan, JS
    SOUTHCON/96 - CONFERENCE RECORD, 1996, : 390 - 395
  • [8] ANALYSIS OF HOT-CARRIER-INDUCED DEGRADATION MODE ON PMOSFETS
    MATSUOKA, F
    IWAI, H
    HAYASHIDA, H
    HAMA, K
    TOYOSHIMA, Y
    MAEGUCHI, K
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1990, 37 (06) : 1487 - 1495
  • [9] Gate current dependent hot-carrier-induced degradation in LDMOS transistors
    Chen, J. F.
    Tian, K. -S.
    Chen, S. -Y.
    Lee, J. R.
    Wu, K. -M.
    Huang, T. -Y.
    Liu, C. M.
    ELECTRONICS LETTERS, 2008, 44 (16) : 991 - 992
  • [10] Hot-carrier-induced degradation of N2O-oxynitrided gate oxide NMOSFET's
    Matsuoka, T
    Tauchi, S
    Ohtsuka, H
    Taniguchi, K
    Hamaguchi, C
    Kakimoto, S
    Uda, K
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1996, 43 (09) : 1364 - 1373