The excitation structure in a micro-hollow cathode discharge in the normal regime at medium argon pressure

被引:43
作者
Lazzaroni, C. [1 ]
Chabert, P. [1 ]
Rousseau, A. [1 ]
Sadeghi, N. [2 ,3 ]
机构
[1] Ecole Polytech, CNRS, Lab Phys Plasmas, F-91128 Palaiseau, France
[2] Univ Grenoble 1, Spectrometrie Phys Lab, Grenoble, France
[3] CNRS, Grenoble, France
关键词
ELECTRON-ION RECOMBINATION; PLASMA; MODE;
D O I
10.1088/0022-3727/43/12/124008
中图分类号
O59 [应用物理学];
学科分类号
摘要
A microplasma is generated in the micro-hole (400 mu m diameter) of a molybdenum-alumina-molybdenum sandwich (MHCD type) at medium pressure (30-200 Torr) in pure argon. Imaging and emission spectroscopy have been used to study the light emission mechanisms in the micro-discharge. We find that the emission intensities of both argon atom and argon ion lines present sharp peaks located near the cathode, and that the position of these peaks moves towards the cathode with increasing gas pressure. An ionizing-sheath model has been developed to calculate the evolution of the sheath thickness as a function of the gas pressure. This model includes the ratio between the ion flux coming from the bulk of the plasma and the ion flux created in the sheath and also accounts for the gas heating in the micro-hole. The variation of the calculated ionizing-sheath thickness as a function of pressure agrees well with the variation of the measured peak positions. The case of a sheath free of ionization has also been considered. However, the comparison between experiments and the various theories shows that a significant fraction of the ionization occurs in the sheath.
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页数:7
相关论文
共 22 条
[1]   Comprehensive parameter study of a micro-hollow cathode discharge containing xenon [J].
Adler, F ;
Davliatchine, E ;
Kindel, E .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2002, 35 (18) :2291-2297
[2]   Analysis of the self-pulsing operating mode of a microdischarge [J].
Aubert, Xavier ;
Bauville, Gerard ;
Guillon, Jean ;
Lacour, Bernard ;
Puech, Vincent ;
Rousseau, Antoine .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2007, 16 (01) :23-32
[3]   Predicted properties of microhollow cathode discharges in xenon [J].
Boeuf, JP ;
Pitchford, LC ;
Schoenbach, KH .
APPLIED PHYSICS LETTERS, 2005, 86 (07) :1-3
[4]  
COBINE JD, 1958, GASEOUS CONDUCTORS, P220
[5]   TRANSIENT CURRENT AND SHEATH MOTION FOLLOWING THE PHOTOELECTRON-INITIATED AVALANCHE IN DC GLOW-DISCHARGES [J].
DEBONTRIDE, H ;
DEROUARD, J ;
EDEL, P ;
ROMESTAIN, R ;
SADEGHI, N ;
BOEUF, JP .
PHYSICAL REVIEW A, 1989, 40 (09) :5208-5219
[6]   Modeling of Mode Transition Behavior in Argon Microhollow Cathode Discharges [J].
Deconinck, Thomas ;
Raja, Laxminarayan L. .
PLASMA PROCESSES AND POLYMERS, 2009, 6 (05) :335-346
[7]   ELECTRON-ION RECOMBINATION IN DENSE PLASMAS [J].
HINNOV, E ;
HIRSCHBERG, JG .
PHYSICAL REVIEW, 1962, 125 (03) :795-+
[8]   3-BODY ASSOCIATION REACTIONS OF HE+, NE+, AND AR+ IONS IN THEIR PARENT GASES FROM 78-K TO 300-K [J].
JOHNSEN, R ;
CHEN, A ;
BIONDI, MA .
JOURNAL OF CHEMICAL PHYSICS, 1980, 73 (04) :1717-1720
[9]   Electron and ion kinetics in a micro hollow cathode discharge [J].
Kim, G. J. ;
Iza, F. ;
Lee, J. K. .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2006, 39 (20) :4386-4392
[10]   Modelling of microdischarge devices: plasma and gas dynamics [J].
Kushner, MJ .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2005, 38 (11) :1633-1643