Patterning of graphene for flexible electronics with remote atmospheric-pressure plasma using dielectric barrier

We show results of the patterning of graphene layers on poly(ethylene terephthalate) (PET) films through remote atmospheric-pressure dielectric barrier discharge plasma. The size of plasma discharge electrodes was adjusted for large-area and role-to-role-type substrates. Optical emission spectroscopy (OES) was used to analyze the characteristics of charge species in atmospheric-pressure plasma. The OES emission intensity of the O-2* peaks (248.8 and 259.3 nm) shows the highest value at the ratio of N-2 : clean dry air (CDA) = 100 : 1 due to the highest plasma discharge. The PET surface roughness and hydrophilic behavior were controlled with CDA flow rate during the process. Although the atmospheric-pressure plasma treatment of the PET film led to an increase in the FT-IR intensity of C-O bonding at 1240 cm(-1), the peak intensity at 1710 cm(-1) (C=O bonding) decreased. The patterning of graphene layers was confirmed by scanning electron microscopy and Raman spectroscopy. (C) 2016 The Japan Society of Applied Physics