The Poole-Frenkel conduction in antimony-doped tin selenide thin films
被引:0
|
作者:
Sakrani, SB
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h-index: 0
机构:
Univ Teknol Malaysia, Dept Phys, Thin Film Lab, Johor Bahru 80990, MalaysiaUniv Teknol Malaysia, Dept Phys, Thin Film Lab, Johor Bahru 80990, Malaysia
Sakrani, SB
[1
]
Jabar, SA
论文数: 0引用数: 0
h-index: 0
机构:
Univ Teknol Malaysia, Dept Phys, Thin Film Lab, Johor Bahru 80990, MalaysiaUniv Teknol Malaysia, Dept Phys, Thin Film Lab, Johor Bahru 80990, Malaysia
Jabar, SA
[1
]
机构:
[1] Univ Teknol Malaysia, Dept Phys, Thin Film Lab, Johor Bahru 80990, Malaysia
tin selenide;
solid state reaction;
Poole-Frenkel conduction;
field-lowering coefficient;
D O I:
10.1117/12.300686
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
Tin selenide thin films have been prepared onto glass substrates at a temperature 240 degrees C and fixed film thickness by means of a solid state reaction process at pressure about 10(-5) mbar. Low level antimony doping was maintained at a concentration 1.8%. The dark current-voltage measurements have been performed on the sandwiched structures of Al-SnSe-Al and Al-SnSe:Sb-Al at temperatures in the range 143-300 K, and the results showed a In J proportional to V-1/2 dependence which was indicative of the Poole-Frenkel effect, It was found that, the calculated field-lowering coefficients, beta(p) for the latter samples (3.71-4.81 x 10(-5) eV m(1/2) V-1/2) were higher than the predicted value (2.18 x 10(-5) eV m(1/2) V-1/2) by a factor of 1.71-2.21. These were further confirmed by the linear dependence of the graph's slope and inverse of temperature. The results were explained in terms of lowering potential barrier by the interaction of electron with applied electric field.