共 50 条
- [3] Ion implantation induced damage in relaxed Si0.75Ge0.25 Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1996, 112 (1-4): : 301 - 304
- [4] Ion implantation induced damage in relaxed Si0.75Ge0.25 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1996, 112 (1-4): : 301 - 304
- [6] On erbium lattice location in ion implanted Si0.75Ge0.25 alloy: Computer simulation of Rutherford backscattering/channeling Touboltsev, V. (vladimir.touboltsev@phys.jyu.fi), 1600, American Institute of Physics Inc. (93):
- [7] Thermal reaction of nickel and Si0.75Ge0.25 alloy JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2002, 20 (06): : 1903 - 1910
- [8] Short-period (Si14/Si0.75Ge0.25)20 superlattices for the growth of high-quality Si0.75Ge0.25 alloy layers COMOS FRONT-END MATERIALS AND PROCESS TECHNOLOGY, 2003, 765 : 193 - 198