Surface Energy Driven Cubic-to-Hexagonal Grain Growth of Ge2Sb2Te5 Thin Film

被引:29
作者
Zheng, Yonghui [1 ,2 ]
Cheng, Yan [1 ]
Huang, Rong [3 ]
Qi, Ruijuan [3 ]
Rao, Feng [1 ]
Ding, Keyuan [1 ,2 ]
Yin, Weijun [1 ]
Song, Sannian [1 ]
Liu, Weili [1 ]
Song, Zhitang [1 ]
Feng, Songlin [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] East China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200062, Peoples R China
来源
SCIENTIFIC REPORTS | 2017年 / 7卷
基金
中国国家自然科学基金;
关键词
TRANSMISSION ELECTRON-MICROSCOPY; PHASE-CHANGE; CRYSTALLIZATION; TRANSFORMATION; TRANSITIONS;
D O I
10.1038/s41598-017-06426-2
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Phase change memory (PCM) is a promising nonvolatile memory to reform current commercial computing system. Inhibiting face-centered cubic (f-) to hexagonal (h-) phase transition of Ge2Sb2Te5 (GST) thin film is essential for realizing high-density, high-speed, and low-power PCM. Although the atomic configurations of f- and h-lattices of GST alloy and the transition mechanisms have been extensively studied, the real transition process should be more complex than previous explanations, e.g. vacancy-ordering model for f-to-h transition. In this study, dynamic crystallization procedure of GST thin film was directly characterized by in situ heating transmission electron microscopy. We reveal that the equilibrium to h-phase is more like an abnormal grain growth process driven by surface energy anisotropy. More specifically, [0001]-oriented h-grains with the lowest surface energy grow much faster by consuming surrounding small grains, no matter what the crystallographic reconfigurations would be on the frontier grain-growth boundaries. We argue the widely accepted vacancy-ordering mechanism may not be indispensable for the large-scale f-to-h grain growth procedure. The real-time observations in this work contribute to a more comprehensive understanding of the crystallization behavior of GST thin film and can be essential for guiding its optimization to achieve high-performance PCM applications.
引用
收藏
页数:8
相关论文
共 50 条
  • [41] Characterization of Agx(Ge2Sb2Te5)1-x thin film by RF magnetron sputtering
    Kim, Dong Hun
    Kim, Myung Sun
    Kim, Ran-Young
    Kim, Kyung Sun
    Kim, Ho Gi
    MATERIALS CHARACTERIZATION, 2007, 58 (05) : 479 - 484
  • [42] An experimental study of Ge diffusion through Ge2Sb2Te5
    Luong, Minh Anh
    Ran, Sijia
    Bernard, Mathieu
    Claverie, Alain
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2022, 152
  • [43] A body-centered-cubic polymorph of the Ge2Sb2Te5 phase change alloy
    Cheng, Y. Q.
    Xu, M.
    Sheng, H. W.
    Meng, Y.
    Han, X. D.
    Ma, E.
    APPLIED PHYSICS LETTERS, 2009, 95 (13)
  • [44] In situ TEM study of crystallization and chemical changes in an oxidized uncapped Ge2Sb2Te5 film
    Singh, Manish Kumar
    Ghosh, Chanchal
    Miller, Benjamin
    Kotula, Paul G.
    Tripathi, Shalini
    Watt, John
    Bakan, Gokhan
    Silva, Helena
    Carter, C. Barry
    JOURNAL OF APPLIED PHYSICS, 2020, 128 (12)
  • [45] First-principles study of nitrogen doping in cubic and amorphous Ge2Sb2Te5
    Caravati, S.
    Colleoni, D.
    Mazzarello, R.
    Kuehne, T. D.
    Krack, M.
    Bernasconi, M.
    Parrinello, M.
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2011, 23 (26)
  • [46] Observation of carrier localization in cubic crystalline Ge2Sb2Te5 by field effect measurement
    Qian, Hang
    Tong, Hao
    He, Ming-Ze
    Ji, Hong-Kai
    Zhou, Ling-Jun
    Xu, Ming
    Miao, Xiang-Shui
    SCIENTIFIC REPORTS, 2018, 8
  • [47] STRUCTURE OF Ge2Sb2Te5 THIN FILMS NEAR THE INFLECTION POINT OF THE RESISTIVITY TEMPERATURE DEPENDENCE
    Zaytseva, Y.
    Lazarenko, P.
    Vorobyov, Yu
    Yakubov, A.
    Borgardt, N.
    Kozyukhin, S.
    Sherchenkov, A.
    CHALCOGENIDE LETTERS, 2020, 17 (02): : 41 - 47
  • [48] Effects of thermal and laser annealing on the structure of Ge2Sb2Te5 thin films
    Turmanova, K.
    Prikhodko, O.
    Tolepov, Zh.
    Maksimova, S.
    Manabaev, N.
    Almas, N.
    CHALCOGENIDE LETTERS, 2024, 21 (07): : 575 - 581
  • [49] Characteristics of Ge2Sb2Te5 thin films deposited by DC magnetron sputtering
    Song, YS
    Chung, CW
    JOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY, 2003, 9 (05) : 551 - 555
  • [50] Optical nonlinear absorption characteristics of crystalline Ge2Sb2Te5 thin films
    Liu, Shuang
    Wei, Jingsong
    Gan, Fuxi
    JOURNAL OF APPLIED PHYSICS, 2011, 110 (03)