Correction of iso-focal tilt in phase edge lithography by adjustment of primary spherical aberration

被引:0
|
作者
Nakao, S [1 ]
Tsujita, K [1 ]
Arimoto, I [1 ]
Wakamiya, W [1 ]
机构
[1] Mitsubishi Elect Corp, ULSI Dev Ctr, Itami, Hyogo 6648641, Japan
来源
MICROPROCESSES AND NANOTECHNOLOGY 2000, DIGEST OF PAPERS | 2000年
关键词
D O I
10.1109/IMNC.2000.872611
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:38 / 39
页数:2
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