Degradation analysis and current collapse imaging of AlGaN/GaN HEMTs by measurement of electric field-induced optical second-harmonic generation

被引:8
作者
Katsuno, T. [1 ]
Manaka, T. [2 ]
Ishikawa, T. [1 ]
Ueda, H. [1 ]
Uesugi, T. [1 ]
Iwamoto, M. [2 ]
机构
[1] Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan
[2] Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
关键词
GaN; Reliability; Degradation; Current collapse; SHG; MOBILITY; RELIABILITY; PERFORMANCE; TRANSISTORS;
D O I
10.1016/j.microrel.2014.07.025
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
On the basis of electric field-induced optical second-harmonic generation (EFISHG) measurements, the degradation of AlGaN/GaN high electron mobility transistor (HEMT) devices was analyzed and the current collapse phenomenon was imaged. Strong second-harmonic (SH) signals were observed at the gate edge at the site of a small defect during the application of a high drain stress voltage (300 V), thus indicating that this technique can identify degradation of HEMTs. The EFISHG technique also generated images of the trapped carriers that lead to current collapse in these devices during the on-state. Immediately following the completion of drain-stress voltage application in the off-state (that is, 1 mu s), SH signals were observed at the gate edge on the drain electrode. This signal location is in good agreement with the well-known virtual gate model of current collapse. The EFISHG measurement technique is therefore capable of detecting pre-breakdown phenomena and producing images of current collapse in AlGaN/GaN HEMT devices. (C) 2014 Elsevier Ltd. All rights reserved.
引用
收藏
页码:2227 / 2231
页数:5
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