Bistability of oxygen vacancy in silicon dioxide

被引:1
作者
Oshiyama, A [1 ]
机构
[1] Univ Tsukuba, Inst Phys, Tsukuba, Ibaraki 305, Japan
来源
DEFECTS IN SEMICONDUCTORS - ICDS-19, PTS 1-3 | 1997年 / 258-2卷
关键词
SiO2; oxygen vacancy; bistability; negative-U; LDA;
D O I
10.4028/www.scientific.net/MSF.258-263.1479
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
I report total-energy electronic-structure calculations within the local density approximation in density functional theory performed for oxygen vacancy V in alpha-quartz. I find (i) that the O vacancy has a variety of charge states from V++ to V(-)depending on the location of the electron chemical potential in the energy gap, (ii) that for V-0 and V+ the O vacancy shows structural bistability, and (iii) that a set of charge states ( V++, V+, V-0) is an effective negative-U system which is accompanied by a charge-state dependent structural transformation.
引用
收藏
页码:1479 / 1484
页数:6
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