Robust Two-Dimensional Topological Insulators in Methyl-Functionalized Bismuth, Antimony, and Lead Bilayer Films

被引:171
作者
Ma, Yandong [1 ,2 ]
Dai, Ying [2 ]
Kou, Liangzhi [3 ]
Frauenheim, Thomas [3 ]
Heine, Thomas [1 ]
机构
[1] Jacobs Univ Bremen, D-28759 Bremen, Germany
[2] Shandong Univ, Sch Phys, State Key Lab Crystal Mat, Jinan 250100, Peoples R China
[3] Univ Bremen, Bremen Ctr Computat Mat Sci, D-28359 Bremen, Germany
基金
欧洲研究理事会; 美国国家科学基金会;
关键词
Topological insulators; Dirac states; Quantum spin Hall effect; Two-dimensional material; Large band gap; Strain engineering; TOTAL-ENERGY CALCULATIONS; DIRAC CONE;
D O I
10.1021/nl504037u
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
One of the major obstacles to a wide application range of the quantum spin Hall (QSH) effect is the lack of suitable QSH insulators with a large bulk gap. By means of first-principles calculations including relativistic effects, we predict that methyl-functionalized bismuth, antimony, and lead bilayers (Me-Bi, Me-Sb, and Me-Pb) are 2D topological insulators (TIs) with protected Dirac type topological helical edge states, and thus suitable QSH systems. In addition to the explicitly obtained topological edge states, the nontrivial topological characteristic of these systems is confirmed by the calculated nontrivial Z(2) topological invariant. The TI characteristics are intrinsic to the studied materials and are not subject to lateral quantum confinement at edges, as confirmed by explicit simulation of the corresponding nanoribbons. It is worthwhile to point out that the large nontrivial bulk gaps of 0.934 eV (Me-Bi), 0.386 eV (Me-Sb), and 0.964 eV (Me-Pb) are derived from the strong spin-orbit coupling within the px and py orbitals and would be large enough for room-temperature application. Moreover, we show that the topological properties in these three systems are robust against mechanical deformation. These novel 2D TIs with such giant topological energy gaps are promising platforms for topological phenomena and possible applications at high temperature.
引用
收藏
页码:1083 / 1089
页数:7
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