Optical metrology for MR heads

被引：3
作者：
Kief, MT
AlJumaily, G
Mowry, GS
机构：
[1] Seagate Technology, Minneapolis
来源：
IEEE TRANSACTIONS ON MAGNETICS | 1997年 / 33卷 / 05期
关键词：
D O I：
10.1109/20.617800
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The volume production of magnetoresistive heads requires fast and precise measurement of many critical material parameters such as film thickness and roughness. Optical metrology is ideally suited to perform these measurements. We review and demonstrate the application of Ellipsometry and Scatterometry for MR head metrology. We report results for NiFe film thickness measurements and Sendust surface roughness measurements with sub-Angstrom precision and repeatability.
引用
收藏
页码：2926 / 2928
页数：3
相关论文
共 4 条
  • [1] [Anonymous], OPTICAL SCATTERING
  • [2] Azzam R., 1977, ELLIPSOMETRY POLARIZ
  • [3] Chipman R.A., 1995, Handbook of Optics, VII
  • [4] Edwards D.F., 1985, Handbook of optical constants of solids
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