Up- and downstream sheaths in an ion-beam-plasma system

被引：4
作者：
Wei, Zi-an
Ma, J. X. [1 ]
机构：
[1] Univ Sci & Technol China, CAS Key Lab Geospace Environm, Hefei 230026, Anhui, Peoples R China
来源：
PHYSICS OF PLASMAS | 2016年 / 23卷 / 02期
基金：
中国国家自然科学基金;
关键词：
ELECTRON; COLLECTION; VELOCITY;
D O I：
10.1063/1.4941591
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
Ion sheaths formed in the up-and downstream sides of a negatively biased metal plate/mesh in an ion-beam-background-plasma system were experimentally investigated in a double plasma device. Measured potential profiles near the plate exhibit asymmetric structure, showing thicker sheath in the downstream side. The presence of the ion beam causes the shrink of the sheaths on both sides. The sheath thickness decreases with the increase of beam energy and density. Furthermore, the sheaths near the mesh are substantially thinner than that near the plate because of the partial transmission of the mesh to the ions. In addition, the increase of neutral gas pressure leads to the reduction of the beam energy and density, resulting in the increase of the sheath thickness. (C) 2016 AIP Publishing LLC.
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页数：5
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