Fabricating two-dimensional nanostructured tellurium thin films via pyrolyzing a single-source molecular precursor

被引：2

作者：

Wang, Shun ^{[1
]}

Wen, Haihong ^{[1
]}

Guan, Weipeng ^{[1
]}

Zhang, Lijie ^{[1
]}

Ma, Dekun ^{[1
]}

Huang, Shaoming ^{[1
]}

Wang, Jichang ^{[2
]}

机构：

[1] Wenzhou Univ, Nanomat & Chem Key Lab, Wenzhou 325027, Zhejiang, Peoples R China

[2] Univ Windsor, Dept Chem & Biochem, Windsor, ON N9B 3P4, Canada

来源：

THIN SOLID FILMS | 2010年 / 518卷 / 15期

关键词：

Nanostructured thin films; Morphology; Pyrolysis; Diethyldithiocarbamato tellurium; Tellurium; CHEMICAL-VAPOR-DEPOSITION; UV LASER PHOTOLYSIS; SEMICONDUCTOR; GROWTH; DECOMPOSITION; NANOTUBES; KINETICS; SELENIUM; DEVICES; SENSOR;

D O I：

10.1016/j.tsf.2009.12.081

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A simple route to fabricate tellurium (Te) thin film with a well-defined two-dimensional nanostructure is presented in this study. The method involves dip-coating and subsequently pyrolyzing a single-source molecular precursor diethyldithiocarbamato tellurium (TDEC) onto a glass substrate. The pyrolysis temperature and the initial thickness (d) of TDEC film exhibited strong influence on the morphology of Te film, where films composed of uniform Te nanoflakes have been obtained at 440 degrees C and d approximate to 490 nm. Investigations on the thermodynamic properties of TDEC through thermogravimetry, differential thermogravimetry, and differential scanning calorimetry techniques suggest that the production of Te from TDEC features random and continuous nucleation, shedding light on the possible growth mechanism of the two-dimensional Te film. (C) 2009 Elsevier By. All rights reserved.

引用

页码：4215 / 4220

页数：6

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