Improved n-Type 4H-SiC Epitaxial Radiation Detectors by Edge Termination

被引:22
|
作者
Nguyen, Khai V. [1 ]
Mannan, Mohammad A. [2 ]
Mandal, Krishna C. [1 ]
机构
[1] Univ S Carolina, Dept Elect Engn, Columbia, SC 29208 USA
[2] Intel Corp, Portland Technol Dev, Hillsboro, OR 97129 USA
关键词
4H-SiC; deep level transient spectroscopy; edge termination; epitaxial layer; Schottky barrier detector; DEEP LEVELS; SUBSTRATE;
D O I
10.1109/TNS.2015.2496902
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new edge termination with SiO2 and Si3N4 passivating layers has been developed and is shown to be a very effective method for improving energy resolution of 20 mu m n-type 4H-SiC epilayer Schottky barrier radiation detectors. The junction properties of the fabricated detectors before and after edge termination were studied by current-voltage (I-V) and capacitance-voltage (C-V) measurements. A thermionic emission model applied to the forward I-V characteristics showed surface barrier height of similar to 1.4 eV and diode ideality factor of similar to 1.1. The C-V measurements showed a doping concentration of 1.8 x 10(14) cm(-3) which ensured a fully depleted (similar to 20 mu m) detector at bias voltages as low as similar to 70 V. Alpha spectroscopy measurements revealed an improved energy resolution from similar to 0.7% to similar to 0.4% for 5.48 MeV alpha particles. Deep level transient spectroscopy (DLTS) measurements have shown a decreased concentration of Z(1/2) defect levels in detectors following edge termination.
引用
收藏
页码:3199 / 3206
页数:8
相关论文
共 50 条
  • [41] Development of 10 kV 4H-SiC JBS diode with FGR termination
    Huang Runhua
    Tao Yonghong
    Cao Pengfei
    Wang Ling
    Chen Gang
    Bai Song
    Li Rui
    Li Yun
    Zhao Zhifei
    JOURNAL OF SEMICONDUCTORS, 2014, 35 (07)
  • [42] Development of 10 kV 4H-SiC JBS diode with FGR termination
    黄润华
    陶永洪
    曹鹏飞
    汪玲
    陈刚
    柏松
    栗瑞
    李赟
    赵志飞
    Journal of Semiconductors, 2014, (07) : 60 - 63
  • [43] Glide of threading edge dislocations after basal plane dislocation conversion during 4H-SiC epitaxial growth
    Abadier, Mina
    Song, Haizheng
    Sudarshan, Tangali S.
    Picard, Yoosuf N.
    Skowronski, Marek
    JOURNAL OF CRYSTAL GROWTH, 2015, 418 : 7 - 14
  • [44] Electrical characteristics and structural properties of ohmic contacts to p-type 4H-SiC epitaxial layers
    K. V. Vasilevskii
    S. V. Rendakova
    I. P. Nikitina
    A. I. Babanin
    A. N. Andreev
    K. Zekentes
    Semiconductors, 1999, 33 : 1206 - 1211
  • [45] Gettering effect with Al implanted into 4H-SiC CVD epitaxial layers
    Kalinina, E
    Kholujanov, G
    Sitnikova, A
    Kossov, V
    Yafaev, R
    Pensl, G
    Reshanov, S
    Hallén, A
    Konstantinov, A
    SILICON CARBIDE AND RELATED MATERIALS - 2002, 2002, 433-4 : 637 - 640
  • [46] Electrical characteristics and structural properties of ohmic contacts to p-type 4H-SiC epitaxial layers
    Vasilevskii, KV
    Rendakova, SV
    Nikitina, IP
    Babanin, AI
    Andreev, AN
    Zekentes, K
    SEMICONDUCTORS, 1999, 33 (11) : 1206 - 1211
  • [47] Annealing behavior of the EB-centers and M-center in low-energy electron irradiated n-type 4H-SiC
    Beyer, F. C.
    Hemmingsson, C.
    Pedersen, H.
    Henry, A.
    Janzen, E.
    Isoya, J.
    Morishita, N.
    Ohshima, T.
    JOURNAL OF APPLIED PHYSICS, 2011, 109 (10)
  • [48] 4H-SiC (11(2)over-bar-0) epitaxial growth
    Kimoto, T
    Yamamoto, T
    Chen, ZY
    Yano, H
    Matsunami, H
    SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 : 189 - 192
  • [49] The evolution of defects in n-type 4H-SiC Schottky barrier diode irradiated with swift heavy ion using the Deep Level Transient Spectroscopy
    Yang, Zhimei
    Li, Yun
    Huang, Mingmin
    Gong, Min
    Ma, Yao
    MICROELECTRONICS RELIABILITY, 2024, 163
  • [50] Effects of proton radiation on field limiting ring edge terminations in 4H-SiC junction barrier Schottky diodes
    Song, QingWen
    Tang, XiaoYan
    Han, Chao
    Yuan, Hao
    Yang, Shuai
    He, XiaoNing
    Zhang, YiMeng
    Zhang, YiMen
    Zhang, YuMing
    SCIENCE CHINA-TECHNOLOGICAL SCIENCES, 2019, 62 (07) : 1210 - 1216