charge carrier processes;
MOSFETs;
random noise;
semiconductor-device modeling;
semiconductor-device noise;
D O I:
10.1109/TED.2007.900684
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
This paper discusses the discrete channel dopant effects on the statistical variation of random telegraph signal (RTS) magnitude, which is defined by the threshold-voltage shift by RTS in MOSFETs. An analytical model for the statistical variation of RTS magnitude is presented. Considering discrete dopant effects, the RTS magnitude of MOSFETs exhibits a log-normal distribution, while the threshold voltage itself exhibits a normal distribution. The threshold-voltage shift by RTS will become a serious concern in 50-nm Flash memories and beyond.