Fabrication of silicon nanorod arrays via a facile metal-assisted chemical etching method

被引：3

作者：

Zhu, Y. F. ^{[1
]}

Zhou, L. ^{[2
]}

Pan, C. J. ^{[1
]}

Guo, X. ^{[1
]}

Gu, F. ^{[1
]}

Wang, H. L. ^{[1
]}

Ni, C. ^{[3
]}

机构：

[1] Huaiyin Inst Technol, Jiangsu Prov Key Lab Intervent Med Devices, Huaian 223003, Peoples R China

[2] Huaiyin Inst Technol, Fac Math & Phys, Huaian 223003, Peoples R China

[3] Univ Delaware, Dept Mat Sci & Engn, Newark, DE 19716 USA

来源：

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS | 2016年 / 27卷 / 06期

基金：

中国国家自然科学基金;

关键词：

HETEROJUNCTION SOLAR-CELLS; HIGH-ASPECT-RATIO; NANOWIRE ARRAYS; SI NANOWIRES; SURFACE; LITHOGRAPHY; EFFICIENCY;

D O I：

10.1007/s10854-016-4499-0

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Si nanorod arrays exhibit promising potential applications in many fields compared with the bulk counterpart. Therefore, development of a facile and cost-effective method for the fabrication of this kind of nanostructures is essential to enabling a wide range of advanced technologies in electronics and optics. In this paper, a simple and low cost method is presented and the fabrication process includes a combination of polystyrene sphere lithography and metal-assisted chemical etching. Compared with previously reported polystyrene sphere lithography methods, present fabrication has the advantage of simplicity. In addition, the fabrication involves no reactive ion etching equipment or noble metal deposition facilities. Based on the experimental results, a plausible mechanism is proposed to explain the formation of Si nanorod arrays.

引用

页码：5833 / 5838

页数：6

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