The influence of initial surface conditions on field crystallization of anodic aluminum oxide films determined by synchrotron X-ray diffraction

被引:0
作者
Sakairi, M. [1 ]
Kikuchi, T. [1 ]
Suda, T. [1 ]
Nagasawa, D.
Sato, M.
机构
[1] Hokkaido Univ, Grad Sch Engn, Kita Ku, Sapporo, Hokkaido 0608628, Japan
关键词
anodic oxide film; aluminum; synchrotron radiation; field crystallization; X-ray diffraction; DIELECTRIC-PROPERTIES; MORPHOLOGY; SI;
D O I
10.1002/sia.3157
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
X-ray diffraction measurements were performed using synchrotron radiation at the SPring-8 facility and electrochemical techniques to investigate the effect of polishing methods and storage conditions on the crystal structure of air-formed oxide films and anodic oxide films formed on highly pure aluminum. Storage in an N(2) environment hinders local film breakdown during anodizing, and it was established that the X-ray diffraction measurements showed the presence of a gamma-Al(2)O(3) in the anodic oxide film formed on mechanically polished (MP) specimens. Formation of gamma-Al(2)O(3) during anodizing was inhibited by electropolishing because of the removal of the work-hardened layer that was formed on the MP by electro-polishing. The X-ray diffraction results do not show clear differences in the influence of the polishing method on the crystal structure of air formed oxide film. This is due to the very fast oxidation rate of the air-formed oxide film and very long storage times for the X-ray measurements. The anodic oxide film formed on aluminum, which has a very flat surface, shows color and the color depended on grain orientation. The electrochemical impedance of the MP specimen is slightly lower than that of the mechanically and then electrochemically polished specimen at the middle frequency range. This impedance difference may be due to formation of gamma-Al(2)O(3) in the amorphous anodic oxide film and the thickness of the film. Copyright (C) 2010 John Wiley & Sons, Ltd.
引用
收藏
页码:215 / 220
页数:6
相关论文
共 20 条
[1]   In situ monitoring of corrosion processes within the bulk of AlMgSi alloys using X-ray microtomography [J].
Eckermann, Fabian ;
Suter, Thomas ;
Uggowitzer, Peter J. ;
Afseth, Andreas ;
Davenport, Alison J. ;
Connolly, Brian J. ;
Larsen, Magnus Hurlen ;
De Carlo, Francesco ;
Schmutz, Patrik .
CORROSION SCIENCE, 2008, 50 (12) :3455-3466
[2]   Aluminum oxide thin dielectric film formation under elevated gravity conditions [J].
Geiculescu, AC ;
Strange, TF .
THIN SOLID FILMS, 2006, 503 (1-2) :45-54
[3]  
HABAZAKI H, 2004, CORROS SCI, V46, P2401
[4]   Synthesis of aluminum oxy-hydroxide nanofibers from porous anodic alumina [J].
Jha, Himendra ;
Kikuchi, Tatsuya ;
Sakairi, Masatoshi ;
Takahashi, Hideaki .
NANOTECHNOLOGY, 2008, 19 (39)
[5]   ELECTROCHEMICAL FABRICATION OF CADMIUM CHALCOGENIDE MICRODIODE ARRAYS [J].
KLEIN, JD ;
HERRICK, RD ;
PALMER, D ;
SAILOR, MJ ;
BRUMLIK, CJ ;
MARTIN, CR .
CHEMISTRY OF MATERIALS, 1993, 5 (07) :902-904
[6]   Microimpedance - Localized material analysis [J].
Lohrengel, MM ;
Heiroth, S ;
Kluger, K ;
Pilaski, M ;
Walther, B .
ELECTROCHIMICA ACTA, 2006, 51 (8-9) :1431-1436
[7]   NANOMATERIALS - A MEMBRANE-BASED SYNTHETIC APPROACH [J].
MARTIN, CR .
SCIENCE, 1994, 266 (5193) :1961-1966
[8]   Structure, morphology, and dielectric properties of nanocomposite oxide films formed by anodizing of sputter-deposited Ta-Al bilayers [J].
Mozalev, A ;
Sakairi, M ;
Takahashi, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2004, 151 (11) :F257-F268
[9]   Growth of multioxide planar film with the nanoscale inner structure via anodizing Al/Ta layers on Si [J].
Mozalev, A. ;
Smith, A. J. ;
Borodin, S. ;
Plihauka, A. ;
Hassel, A. W. ;
Sakairi, M. ;
Takahashi, H. .
ELECTROCHIMICA ACTA, 2009, 54 (03) :935-945
[10]  
NAGTA I, 1997, ALUMINUM ELECT CAPAC, P215