Optoelectronically probing the density of nanowire surface trap states to the single state limit

被引:18
作者
Dan, Yaping [1 ]
机构
[1] Shanghai Jiao Tong Univ, Univ Michigan Shanghai Jiao Tong Univ Joint Inst, Shanghai 200240, Peoples R China
基金
美国国家科学基金会;
关键词
SILICON NANOWIRES; INTERNAL GAIN; PHOTODETECTORS; PHOTOTRANSISTORS; MOS2;
D O I
10.1063/1.4907882
中图分类号
O59 [应用物理学];
学科分类号
摘要
Surface trap states play a dominant role in the optoelectronic properties of nanoscale devices. Understanding the surface trap states allows us to properly engineer the device surfaces for better performance. But characterization of surface trap states at nanoscale has been a formidable challenge using the traditional capacitive techniques. Here, we demonstrate a simple but powerful optoelectronic method to probe the density of nanowire surface trap states to the single state limit. In this method, we choose to tune the quasi-Fermi level across the bandgap of a silicon nanowire photoconductor, allowing for capture and emission of photogenerated charge carriers by surface trap states. The experimental data show that the energy density of nanowire surface trap states is in a range from 10(9) cm(-2)/eV at deep levels to 10(12) cm(-2)/eV near the conduction band edge. This optoelectronic method allows us to conveniently probe trap states of ultra-scaled nano/quantum devices at extremely high precision. (C) 2015 AIP Publishing LLC.
引用
收藏
页数:5
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