Electronic transport of silicon nanowires grown in porous Al2O3 membrane

被引:20
作者
Dayen, J.-F. [1 ]
Rumyantseva, A.
Ciornei, C.
Wade, T. L.
Wegrowe, J.-E.
Pribat, D.
Cojocaru, C. Sorin
机构
[1] Ecole Polytech, Solides Irradies Lab, CNRS, UMR 7642, F-91128 Palaiseau, France
[2] CEA, DSM, DRECAM, F-91128 Palaiseau, France
[3] Ecole Polytech, Phys Interfaces & Couches Minces Lab, CNRS, UMR 7642, F-91128 Palaiseau, France
关键词
D O I
10.1063/1.2731681
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electronic transport properties of silicon nanowires grown by chemical vapor deposition, embedded in an insulating alumina nanoporous membrane are studied. Transport measurements were performed from 300 to 4.2 K, which revealed a scaling law of the conductance as a function of the temperature and the dc bias voltage, which the authors interpreted as a Coulomb blockade manifestation. Magnetoconductive measurements at low temperature revealed a positive magnetoconductance which can be well fitted by quasi-one-dimensional (quasi-1D) weak localization theory. These results seem to indicate that electron-electron interactions and quasi-1D effect predominate on the electronic transport properties of these systems. (c) 2007 American Institute of Physics.
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页数:3
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