Nickel nanoparticles dispersed in SiO2 fabricated by high-flux negative-ion implantation of 60 keV

被引：4

作者：

Amekura, H ^{[1
]}

Kitazawa, H ^{[1
]}

Mochiku, T ^{[1
]}

Umeda, N ^{[1
]}

Takeda, Y ^{[1
]}

Kishimoto, N ^{[1
]}

机构：

[1] Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050003, Japan

来源：

NANO- AND MICROTECHNOLOGY: MATERIALS, PROCESSES, PACKAGING, AND SYSTEMS | 2002年 / 4936卷

关键词：

magnetic nanoparticle; negative-ion; ion implantation; superparamagnetic; nickel; SiO2; surface plasmon resonance;

D O I：

10.1117/12.469676

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The magnetic nanoparticles are fabricated in silica glass (SiO2) using high-flux implantation of nickel negative-ions of 60 keV. Photo-absorption measurements and the cross-sectional transmission electron microscopy (XTEM) observation confirm formation of metallic Ni nanoparticles in SiO2, and exclude possible formation of Ni silicides (Ni3Si, Ni2Si, NiSi) and oxides (NiO) as major products. The mean diameter of the nanoparticles was in similar to2.9 nm, and the depth distribution was similar to the prediction from the TRIDYN code with taking account of the sputtering. Temperature and field- dependences of magnetization show that the nanoparticles are in the super-paramagnetic state with a blocking temperature of similar to27 K.

引用

页码：1 / 8

页数：8

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