We proposed the fabrication of nanodot-type floating gate memory with biomineralized nanodots on silicon-on-insulator. High-density Co bionanodots (Co-BNDs) were adsorbed on SiO2. The current-voltage curve with a large hysteresis caused by electron injection into Co-BNDs and the emission of Co-BNDs were observed. A good retention characteristic due to charge confinement in the potential well of a Co-BND was observed. Good writing and erasing characteristics were observed. We confirmed that the memory has high reliability with good endurance. This proposed flash memory is promising for memory devices in system-on-panel displays owing to its fast writing/erasing speed and high reliability. (C) 2010 The Japan Society of Applied Physics