Pulsed laser deposition of oxide thin films by the fifth harmonic of a Nd:Y3Al5O12 (Nd:YAG) laser

被引：6
|
作者：
Shimizu, Ryota [1 ,2 ]
Sugiyama, Issei [1 ]
Nakamura, Naoto [1 ]
Kobayashi, Shigeru [1 ]
Hitosugi, Taro [1 ]
机构：
[1] Tokyo Inst Technol, Sch Mat & Chem Technol, Tokyo 1528552, Japan
[2] Japan Sci & Technol Agcy, PRESTO, Kawaguchi, Saitama 3320012, Japan
来源：
AIP ADVANCES | 2018年 / 8卷 / 09期
关键词：
OXYGEN DEFICIENCY; TIO2;
D O I：
10.1063/1.5048441
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
We report the pulsed laser deposition (PLD) of anatase TiO2, LaAlO3, and La0.7Ca0.3MnO3 epitaxial thin films by a fifth-harmonic Nd:Y3Al5O12 (Nd:YAG) laser. High-quality anatase Ti0.996Nb0.004O2 epitaxial thin films were deposited and showed transparent conducting properties, with a maximum mobility of 94 cm(2) V-1 s(-1) at 80 K. These results are consistent with those obtained for films deposited by excimer lasers. Furthermore, we report the deposition of droplet-free flat LaAlO3 and La0.7Ca0.3MnO3 films. The latter films exhibited an insulator-to-metal transition at similar to 240 K, accompanied by a large magnetoresistive effect, in agreement with previous studies using excimer lasers. These results indicate that the fifth harmonic of a Nd:YAG laser may be a potential alternative to excimer lasers for PLD. (C) 2018 Author(s).
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页数：6
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