Self-diffusion on Pd(111)

被引:18
作者
Steltenpohl, A
Memmel, N
机构
[1] Max Planck Inst Plasma Phys, Div Surface Sci, EURATOM Assoc, D-85740 Garching, Germany
[2] Univ Innsbruck, Inst Phys Chem, A-6020 Innsbruck, Austria
关键词
diffusion and migration; epitaxy; low index single crystal surfaces; palladium; scanning tunneling microscopy; surface diffusion;
D O I
10.1016/S0039-6028(00)00259-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The barrier and prefactor for self-diffusion of Pd on Pd(111) are derived from scanning tunneling investigations of the homoepitaxial growth of Pd/Pd(111). The barrier for diffusion is found to be 350 meV. This is the highest value observed so far for self-diffusion on a fcc(111) metal surface. Such exceptional behaviour has recently been predicted, as Pd(111)- unlike other fcc(111) transition metals - does not support an occupied free-electron like surface state. An exceptionally high prefactor of 6 x 10(16) s(-1) is observed, indicating a large entropic contribution to diffusion in accordance with the Meyer-Neldel compensation law. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:558 / 561
页数:4
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